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Method for manufacturing TFT array substrate

A manufacturing method and array substrate technology, which are applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve the problems of prolonged manufacturing time and increased manufacturing cost of TFT array substrates, and achieve the effect of simplifying the manufacturing process

Active Publication Date: 2014-06-25
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

To solve the technical problems that the TFT array substrate manufacturing method in the prior art adopts four photolithography processes to complete the manufacture of the entire TFT array substrate, which causes the increase in the manufacturing cost of the TFT array substrate and the prolongation of the manufacturing time

Method used

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  • Method for manufacturing TFT array substrate
  • Method for manufacturing TFT array substrate
  • Method for manufacturing TFT array substrate

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Embodiment Construction

[0025] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention can be practiced. The directional terms mentioned in the present invention, such as "up", "down", "front", "back", "left", "right", "inside", "outside", "side", etc., are for reference only The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention.

[0026] In the figures, structurally similar units are denoted by the same reference numerals.

[0027] The invention relates to a manufacturing method of a TFT array substrate, such as image 3 as shown, image 3 It is a flowchart of a preferred embodiment of the manufacturing method of the TFT array substrate of the present invention. The manufacturing method of the TFT array substrate comprises the following steps:

[0028] Step 101, sequentially ...

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Abstract

A method for manufacturing a TFT array substrate comprises: depositing a first transparent conductive layer and a first metal layer, and performing patterning to form a common electrode (301), a gate (302), and a transparent electrode array (201); depositing an insulating layer (4), an active layer (5), an ohmic contact layer (6), and a second metal layer, and performing patterning to form a source (701) and a drain (702); and depositing a second transparent conductive layer, and performing patterning to form a source contact layer (801), a drain contact layer (802), and a pixel electrode array (803). The present invention simplifies the manufacturing process, saves the manufacturing cost, and saves the manufacturing time.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a method for manufacturing a TFT array substrate that can reduce the number of times of photolithography. Background technique [0002] The LCD (liquid crystal display: liquid crystal display) panel is one of the important components of the liquid crystal display. The existing TFT (thin film transistor: thin film field effect transistor) LCD panel is used due to its low power, small size, and no radiation. Widely used in liquid crystal displays. [0003] The TFT LCD panel includes a TFT array substrate and a color filter substrate, with liquid crystals located between them. At present, the manufacture of the TFT array substrate is mainly by performing a photolithography process on the glass substrate to form a required pattern structure, so as to form TFT elements and corresponding wiring. Since the TFT elements and the wiring on the glass substrate have multiple laye...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/77
CPCG02F1/134363H01L27/1288G02F2001/136295G02F2001/136231G02F1/136231G02F1/136295
Inventor 覃事建
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD