Data storage device and manufacturing method thereof
A manufacturing method and data storage technology, which are applied in the manufacturing/processing of electromagnetic devices, components of fixed capacitors, selection of materials, etc., can solve the problem of low ferroelectric performance of bismuth ferrite, poor performance of data storage devices, and unsuitable practical application. and other problems to achieve the effect of excellent performance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0018] In order to make those skilled in the art understand the technical solutions of the present invention more clearly, the specific implementation manners thereof are described below in conjunction with the accompanying drawings.
[0019] The data storage device of the present invention includes transistors and capacitors, wherein such as figure 1 As shown, the capacitor includes a substrate 1, a lower electrode 2 located on the substrate 1, a conductive layer 3 formed on the lower electrode 2, a bismuth ferrite layer 4 formed on the conductive layer 3, and an upper electrode located on the bismuth ferrite layer 4. Electrode 5.
[0020] The conductive layer 3 is formed of a perovskite structure material, such as lanthanum nickelate or barium plumbate.
[0021] In one embodiment, the substrate 1 has a substrate 11 , a diffusion barrier layer 12 on the substrate 11 , and an adhesion layer 13 on the diffusion barrier layer 12 .
[0022] The substrate 11 is preferably a sili...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 