The present invention discloses a
calcium-doped
bismuth ferrite (Bi 1‑ x Ca x FeO3) thin film
system material preparation method, the method specifically includes the following steps: solution preparation, gel and
powder preparation, target material preparation, bottom
electrode target material preparation, target material and substrate
processing, thin film growth environment control, thin film preparation; the present invention adopts
solvent gel method to ensure the mixing of various components at the
molecular level, the
ceramic target material has
high density, and the epitaxially grown thin film has high
phase purity; the present invention introduces different concentrations of
oxygen vacancies by adjusting the
calcium doping ratio, thereby enhancing the
conductivity of the film, and has great potential application value; the present invention introduces Bi 1‑x Ca x La with small
lattice constant difference from FeO3 0.5 Sr 0.5 The MnO3
electrode material is used as the bottom
electrode, which makes the epitaxially
grown film have atomic-level flat steps, which is conducive to epitaxial growth, reduces defect density, improves film
crystallization quality, and enhances device performance and life.