The application discloses a preparation method of
bismuth ferrite nanometer islands based on a
molecular beam epitaxy method, and comprises the following steps: conveying a substrate into a
molecular beam epitaxy (MBE) growth chamber, wherein the substrate temperature is greater than or equal to the
evaporation temperature of a Bi source; heating the Bi source and a Fe source to the
evaporation temperature, and adjusting the beam current of the Bi source and the Fe source; using pure
ozone as an epitaxial growth
atmosphere, adjusting the pressure of the growth chamber to 2*10 ‑6 -1*10 ‑ 5
Torr, mixing the Bi source and the Fe source in the growth chamber to perform epitaxial growth; and cooling to obtain
bismuth ferrite epitaxial nanometer islands. The application further discloses the
bismuth ferrite nanometer islands obtained by the preparation method and application of the
bismuth ferrite nanometer islands in a ferroelectric memory. The preparation method can realize large-area integration of the
bismuth ferrite epitaxial nanometer islands, does not introduce a second phase such as a template, has simple process steps, and is high in preparation efficiency; the prepared
bismuth ferrite nanometer islands have good integration, are relatively independent between each nanometer island, can perform independent writing and erasing of information, can effectively bind
a domain wall position, and improve the service life of the memory.