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Transmissivity determinator and method of detecting transmissivity

A measuring device and transmittance technology, applied in transmittance measurement, testing optical properties, instruments, etc., can solve problems such as difficult measurement, and achieve the effect of suppressing errors

Active Publication Date: 2012-08-08
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

That is, the transmittance of the semi-transmissive film pattern measured using a photodetector changes depending on the pattern on the transfer pattern forming surface, so it is difficult to measure accurately

Method used

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  • Transmissivity determinator and method of detecting transmissivity
  • Transmissivity determinator and method of detecting transmissivity
  • Transmissivity determinator and method of detecting transmissivity

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0064] In the first embodiment, the specifications of the elements constituting the transmittance measurement device 100 are as follows. In addition, in this Example 1 and Example 2 described next, since the photomask 8 to be measured is the same in the comparative example and each example, the transmittance T, Ta, Tb, internal reflection transmittance Ix Each value of refers to the value of the comparative example.

[0065] Light source device 2...a semiconductor laser module that emits collimated light with a wavelength of 405nm

[0066] Microscope objective lens of the first converging lens system 3...NA0.4 (tanθ=0.43 in formula (1))

[0067] Light detector 5...Si photodiode

[0068] 2nd converging lens system 6...aspheric lens with focal length 30mm

[0069] Aperture 7...opening pinhole

[0070] Photomask 8...synthetic quartz with thickness t=7.0 mm (refractive index n=1.46966 at wavelength 405 nm)

[0071] The second converging lens system 6 is disposed at a positi...

Embodiment 2

[0077] In Example 2, the specifications of each element constituting the transmittance measurement device 100 are as follows.

[0078] Light source device 2...YAG laser with a wavelength of 355nm + beam expander (collimator)

[0079] Microscope objective lens of the first converging lens system 3...NA0.65 (tanθ=0.86 in formula (1))

[0080] Light detector 5... Photomultiplier tube

[0081] The second converging lens system 6... A lens system with two structures with a focal length of 50mm

[0082] Aperture 7...opening

[0083] Photomask 8...synthetic quartz with thickness t=12.0mm (refractive index n=1.47604 at wavelength 355nm)

[0084] The second converging lens system 6 is disposed at a position where the converging point of the first converging lens system 3 is tripled on the diaphragm 7 (that is, m=3).

[0085] In the second embodiment, according to formula (1), the beam radius L is 41.95 mm. According to the formula (2), the area ratio Sr is 3.20E-4. According to...

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Abstract

The invention provides a transmissivity determinator and a method of detecting transmissivity, which can restrain error caused by internal reflected light and detect the transmissivity of an object area to be detected with high precision. The transmissivity determinator is composed of a light source device for emitting light to be detected; a first optical system for collecting the light to be detected and for forming points on an object to be detected; a second optaical system for collecting lights to be detected and penetrating the object to be detected; an aperture configured to be nearby a forming position of a conjugate image and a light detection unit for detecting the light to be detected and penetrating the aperture.

Description

technical field [0001] The present invention relates to a transmittance measurement device and a transmittance measurement method for measuring the transmittance of a measurement object having a region through which light is transmitted. Background technique [0002] In the manufacturing process of electronic components such as liquid crystal panels, in order to reduce the cost by reducing the number of masks, a so-called multi-color photomask (see Japanese Patent Application Laid-Open No. 2009-258250 (hereinafter referred to as Patent Document 1)). In controlling the transmittance of such a semi-transmissive film pattern, it is important to manage the quality of the multi-color photomask. Therefore, in the quality control of the multi-color photomask, a reference mask is prepared using the same composition as the semi-transmissive film actually patterned, the transmittance is measured, and evaluated as the transmittance of the semi-transmissive film pattern. [0003] Japa...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/59G01M11/02
CPCG01N21/59G01N2201/062
Inventor 石川晋园田恒彦饭塚隆之田中淳一吉田光一郎
Owner HOYA CORP
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