Method and device for detecting fabric skewness

A detection method and fabric technology, applied in textile material inspection, measuring devices, textiles and papermaking, etc., can solve the problems of non-adjustable weft yarn adaptability, small weft yarn adaptability range, difficult production, etc., and achieve simplified structure, wide range, The effect of easy installation

Inactive Publication Date: 2012-09-12
CHANGZHOU COLLEGE OF INFORMATION TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The characteristic of the former is that silicon photocells are easier to manufacture (size 2mm×12mm), but since the corresponding optical system must be installed in front of each silicon photocell, no matter the installation of the silicon photocell (to ensure the correct position and angle), or the entire system It is very difficult to make, and the adaptability to weft yarns of different weft densities is not adjustable
The disadvantage of the latter is that because the weft inclination is generally within the range of ±15o, the detection head is empty most of the time, and the range of adaptability to weft yarns with different weft densities is small, and the effect on slow cloth speed is extremely poor.

Method used

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  • Method and device for detecting fabric skewness
  • Method and device for detecting fabric skewness
  • Method and device for detecting fabric skewness

Examples

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Embodiment 1

[0031] Example 1: Such as Figure 1 ~ Figure 3 As shown, a photoelectric signal detection head for realizing the detection method of fabric weft skew includes a light source 21, a housing 3, an optical lens 11, a photoelectric sensor 22, an image distance moving device, and an object distance moving device.

[0032] The photoelectric sensor 22 in this embodiment uses a miniaturized silicon photocell. The size of the miniaturized silicon photocell is 12mm×12mm, and 13 silicon photocell strips that are not in contact with each other are integrated. The horizontal position is the reference cell strip 22-1. The silicon photovoltaic cell bar and the reference cell bar 22-1 form -6°~+6° respectively, and the corresponding arrangement from top to bottom is: +6°, +4.5°, +3°, +1.5°, +1°, +0.5 °, 0°, -0.5°, -1°, -1.5°, -3°, -4.5°, -6°, the minimum resolution accuracy is 0.5°.

[0033] The image distance moving device includes a lens barrel 8, a stepping motor 15, a gear-16 fixed to the outp...

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Abstract

The invention relates to a method and a device for detecting fabric skewness. The device is a photoelectric signal detection head, a light source emits parallel light to irradiate a moving fabric, images of weft yarns of the fabric are formed by an optical lens, light shading and transmitting effects are generated on a micro-silicon photocell of a photoelectric sensor, the distance between the optical lens and the photoelectric sensor and the distance between each of the optical lens and the photoelectric sensor and the fabric are adjusted by an image distance moving device and an object distance moving device, the paraxial magnification beta of the lens ranges from 1.2 to 1.7, and then skewness of the weft yarns of the fabric measured by the photoelectric sensor is obtained by the aid of the highest current signals outputted by the photoelectric sensor. The micro-silicon photocell comprises silicon photocell strips integrated on the same substrate, the overall size of the micro-silicon photocell is small, the width of the micro-silicon photocell is similar to the thickness of a common weft yarn of a fabric, the signal-to-noise ratio of the signals is high, the same optical system is used, the structure of the micro-silicon photocell is simplified, and the micro-silicon photocell is convenient in installation and high in detection precision, the magnification factor of the optical system is automatically adjusted according to the density of the weft yarns of the fabric, and the optical system is widely adaptable to the densities of weft yarns of fabrics.

Description

Technical field [0001] The invention relates to a method for detecting weft skew of a fabric and a detecting device thereof, and belongs to the technical field of textile equipment. Background technique [0002] The weft straightening device is an indispensable device for correcting the weft deformation caused by technological factors in the textile dyeing and finishing process. Its working principle is to use a detection device to automatically detect the weft inclination of the fabric under the control of a microcomputer, and then automatically adjust the weft through the correction device. The detection methods used in existing weft straightening devices mainly include fixed silicon photocell detection methods and rotating silicon photocell detection methods. The fixed silicon photocell detection method is to project the image formed by the weft of the fabric through the optical lens onto the silicon photocell strips placed at different angles. When the two directions are the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): D06H3/12G01B11/26
Inventor 周正元刘庆新
Owner CHANGZHOU COLLEGE OF INFORMATION TECH
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