Automatic furnace door mechanism for PECVD device

A furnace door, automatic technology, used in gaseous chemical plating, metal material coating process, coating and other directions, can solve problems such as sealing failure, improve production efficiency, and ensure good equipment vacuum effect.

Inactive Publication Date: 2012-10-10
48TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In order to overcome the deficiency that the existing quartz tube orifice end face is not parallel to the furnace door flange surface, resulting in sealing failure, the present invention aims to provide an autom

Method used

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  • Automatic furnace door mechanism for PECVD device
  • Automatic furnace door mechanism for PECVD device
  • Automatic furnace door mechanism for PECVD device

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Embodiment Construction

[0018] The present invention will be further introduced below in conjunction with the accompanying drawings and specific embodiments, but not as a limitation of the present invention.

[0019] figure 1 It is a schematic diagram of the sealing method of the furnace door mechanism. The tubular PECVD equipment uses a quartz tube 8 as a deposition chamber, and an O-ring 9 is used to seal between the furnace door flange 4 and the quartz tube. Vacuum produces atmospheric pressure F to compress the furnace door flange 4 to achieve sealing.

[0020] figure 2 and image 3 Schematic diagram of the working principle of the furnace door mechanism. figure 2 It includes an x-direction cylinder 2 and a y-direction cylinder 5, a base 1, a connecting rod 3, and a furnace door flange 4. Two double-acting cylinders 2 and 5 realize movement in two directions, and one x-direction cylinder 2 realizes the rotation of the furnace door flange 4 by pushing and pulling the connecting rod 3 , ther...

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PUM

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Abstract

The invention discloses a furnace door mechanism for a PECVD device, in order to solve the sealing problem of a quartz tube. The furnace door of the invention includes two double-acting cylinders, a base, a connecting rod, a furnace door flange and two guide rails. The two double-acting cylinders achieve the switch movement of the door flange, and simple and reliable vacuum sealing is realized through flexible connection between the furnace door flange and the connecting rod, thereby ensuring good vacuum and reliability of the device.

Description

technical field [0001] The invention relates to the field of photovoltaic equipment, and further relates to a safe and effective furnace door mechanism in a furnace door system of PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment. Background technique [0002] In the modern photovoltaic production process, PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment is one of the key equipment in the production process of monocrystalline silicon and polycrystalline silicon cells, and its efficiency and stability are related to the efficiency of the entire production line. In today's increasingly competitive environment, it is even more important. How to make the equipment stable and easy to use, as a part of PECVD equipment, the stability of the furnace door mechanism has a great influence on the stability of the entire equipment. [0003] Tubular PECVD equipment uses a quartz tube as a deposition chamber, and a graphite boat that can place multiple silicon wafers ...

Claims

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Application Information

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IPC IPC(8): C23C16/44
Inventor 胡振东易文杰袁卫华许波涛
Owner 48TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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