Plant cultivating substrate as well as preparation method and application of same

A plant cultivation and matrix technology, applied in application, cultivation, agriculture, etc., can solve the problems of fertilizer loss, high construction cost, inconvenient application and construction, etc., and achieve the effects of good survival and growth, low cost, and low later management.

Inactive Publication Date: 2012-10-31
BEIJING UNIV OF CHEM TECH
View PDF10 Cites 28 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method has many steps in the process, the operation process is complicated, and the environmental conditions are high, and the strength of the soil column is low, the water retention performance is poor, and the water supply is insufficient. It is only suitable for application in humid areas, and it is difficult to adapt to arid areas.
[0009] Although the above-mentioned patents help the root system of imported plants to grow long and deep, can promote plant germination and initial growth, and can reduce the withering and damage of seedlings caused by drying, thereby improving the survival rate of plants, some of them are caused by seed beds. Some ingredients contain chemical materials that are not easy to degrade, which will leave hidden dangers for ecological development after use; some artificially added fertilizers are easy to lose with rainfall, polluting groundwater; some have many ingredients, complicated production processes, and high construction costs
Moreover, the use process of the above patents is relatively complicated, and some even require more than ten steps, which causes inconvenience to the application and construction

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Plant cultivating substrate as well as preparation method and application of same
  • Plant cultivating substrate as well as preparation method and application of same
  • Plant cultivating substrate as well as preparation method and application of same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] Fully mix 1000g of soil (sieved) on the campus of Beijing University of Chemical Technology with 0.10g of solid polyaspartic acid water-absorbing resin powder, then add 100ml of water, stir and mix evenly, granulate the soil, put it into a mold, and mold it. made as figure 1 The outer diameter of the upper bottom shown is 10 cm, the outer diameter of the lower bottom is 5 cm, and the height is 5 cm. The axis is provided with a truncated cone 2 with a diameter of 3 cm and a cylindrical hole 3 that runs through the longitudinal direction. Under room temperature, it is naturally dried. After 3 days, the plant cultivation substrate 1 was prepared.

[0046] figure 2 A cross-sectional view of a stage during use of the above-mentioned plant growth substrate is shown. Such as figure 2 As shown, when sowing, first use waste newspaper 4 and starch paste to wrap around the plant cultivation substrate and the lower bottom surface, then 500g humus, 2.5g polyaspartic acid fertil...

Embodiment 2

[0049] Fully mix 2000g of the soil (sieved) on the campus of Beijing University of Chemical Technology with 20.00g of solid polyaspartic acid water-absorbing resin powder, then add 400ml of water, stir and mix evenly, put it into a mold, and mold it to form an outer surface of the upper bottom surface. 20 cm in diameter, 10 cm in outer diameter of the bottom surface, 20 cm in height, and a truncated cone with a diameter of 10 cm and a cylindrical hole passing through the longitudinal direction at the center of the axis. A plant growth substrate is prepared.

[0050] When sowing, first use waste newspaper and starch paste to wrap the surrounding and lower bottom of the plant cultivation substrate, then fully mix 1000g of humus soil, 10.0g of polyaspartic acid fertilizer powder, and add 1.0g of polyaspartic acid A colloidal solution made of water-absorbent resin, stirred and mixed evenly to make a moist plant culture substrate, and added into the cylindrical longitudinal through h...

Embodiment 3

[0054] Fully mix 2000g of the soil (sieved) on the campus of Beijing University of Chemical Technology with 60.00g of solid polyaspartic acid water-absorbing resin powder, then add 600ml of water, stir and mix evenly, put it into a mold, and mold it to form a product such as Figure 4 The outer diameter of the circumscribed circle on the upper bottom surface shown is 20cm, the outer diameter of the circumscribed circle on the lower bottom surface is 15cm, and the height is 30cm. The axis is provided with a truncated triangular pyramid 2 with a diameter of 8cm and a cylindrical hole 3 extending vertically. , put the truncated cone into an oven, and dry it at 60° C. for 18 hours to obtain the plant cultivation substrate 1 .

[0055] Use waste newspaper and starch paste to wrap the surrounding and lower bottom of the plant cultivation substrate, then mix 1000g of humus soil, 10.0g of polyaspartic acid fertilizer powder, and 1.0g of polyaspartic acid water-absorbing resin powder an...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a plant cultivating substrate as well as a preparation method and application of the plant cultivating substrate. The plant cultivating substrate is prepared by taking polyaspartic acid water-absorbent resin as a binder, mixing sand and water, moulding and drying, is preferably a truncated cone with a longitudinal through hole formed at an axis, and can be matched with a plant cultivating medium containing polyaspartic acid fertilizer and a polyaspartic acid water-absorbent resin aquasorb for plant seed preservation and seedling cultivation. The plant cultivating substrate can effectively absorb and retain moisture, can supply moisture and nutritional elements which are necessary to plant growth in an uninterrupted way, so that a greening effect can be achieved and the balance of a local ecological environment and species is not destroyed; therefore, the plant cultivating substrate is particularly applicable to afforestation, barren hill greening and desertification control in arid areas.

Description

technical field [0001] The present invention relates to a plant cultivation substrate and its manufacture and application, in particular to a seed conservation and seedling cultivation substrate added with polyaspartic acid water-absorbing resin and its manufacturing and application method, especially a kind of substrate which is beneficial to arid and semi-arid conditions. The method of growing seedlings and fixing sand in the area. Background technique [0002] The expansion of land desertification and the raging sandstorms are global environmental problems facing mankind today, which seriously affect the normal production and life of human beings. In order to improve and protect the earth's environment, countries around the world have actively carried out research and prevention of desertification and sandstorms. The technologies used to prevent and control desertification and sandstorms mainly include physical sand fixation, chemical sand fixation, biological sand fixat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A01G9/10
Inventor 谭天伟李春玲张文波薛茗元魏军王宇明
Owner BEIJING UNIV OF CHEM TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products