Laser damage testing device for optical thin film
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- NORTHWEST INST OF NUCLEAR TECH
- Publication Date
- 2012-11-14
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to an optical thin film testing device, in particular to an optical thin film laser damage testing device suitable for a high-power excimer laser system. Background technique
[0002] Excimer laser systems are applied to a variety of optical thin films, and thin film laser damage measurement is of great significance to the reliability of the system. The laser damage test of optical thin films not only requires uniform irradiation, but also needs to change the laser power density incident on the thin film in a wide range to meet the requirements of various devices. changes for accurate and reliable measurements.
[0003] "Intense Lasers and Particle Beams" (Vol.10, 1998, p123-126 and Vol.20, 2008, p509-512) disclosed a method for laser damage testing of optical thin films based on single lens focusing. Because of the love spot, it is difficult to obtain the desired uniform irradiation.
[0004] In terms of beam attenuation and l...