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Manufacturing method of multi-needle point array used for large area friction induced micro/nano-processing

A friction-induced, nano-fabrication technology, applied in the field of multi-tip array fabrication, can solve the problems of complex lithography equipment, slow processing speed and low efficiency

Active Publication Date: 2015-05-06
SOUTHWEST JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the current technology has certain limitations: for example, the lithography equipment is becoming more and more complex, and the development cost of the lithography system is increasing exponentially, which has caused the manufacturing cost of the equipment to be almost out of control; the stencil production of nanoimprint technology is facing challenges Challenges such as high cost, low efficiency, and low precision
At present, friction-induced micro / nano-fabrication technology is mainly completed by scanning probe microscope, which generally can only work in single-probe mode, with slow processing speed and low efficiency
Moreover, its processing range generally does not exceed 100 microns, and it is difficult to meet the requirements of mass production, which seriously hinders the application of friction-induced micro / nano processing technology.

Method used

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  • Manufacturing method of multi-needle point array used for large area friction induced micro/nano-processing

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Embodiment

[0025] figure 1 It is shown that a specific embodiment of the present invention is a method for manufacturing a multi-tip array for large-area friction-induced micro / nano processing, the steps of which are:

[0026] (a) Place the wax sheet substrate on the workbench of the microhardness tester, make the indenter of the microhardness tester indent the surface of the wax sheet substrate, and process the indentation array (see part a);

[0027] (b) Place microspheres of the same size on each indentation of the indentation array one by one (see part b);

[0028] (c) Use a flat and smooth pressing tablet to cover the microspheres on the base of the wax sheet, apply a load to the pressing sheet to press each microsphere into the wax sheet at the same time, the pressing depth is 0.7-1.0 times the radius of the microsphere, and each The indentation depth of the microspheres is consistent, forming a microsphere array on the wax substrate (see part c);

[0029] (d) press the pouring f...

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Abstract

The invention relates to a manufacturing method of a multi-needle point array used for large area friction induced micro / nano-processing. The method comprises the steps of: (a) using the pressure head of a microhardness tester to conduct indenting on a wax sheet substrate surface for processing an indentation array; (b) placing microspheres on each indentation; (c) covering the microspheres with a flat and smooth pressing sheet, exerting a load on the pressing sheet to make each microsphere pressed into the wax sheet simultaneously, thus forming a microsphere array; (d) pressing a pouring frame on the wax sheet substrate, and making the microsphere array framed by the pouring frame; (e) pouring an inlay material solution into the pouring frame, and making the solution submerge the microsphere array; and (f) after solidification of the inlay material solution, conducting heating and melting to remove the wax sheet, then taking the inlay material out from the pouring frame, and polishing the microsphere-free back of the inlay material to a plane, thus obtaining the multi-needle point array used for large area friction induced micro / nano-processing. The method has the advantages of simple operation, cheap raw materials, no need for glue spraying, oxidation, photoetching, anisotropic etching and other complex and special treatments, thus having the obvious characteristics of low cost and high efficiency.

Description

technical field [0001] The invention relates to a method for fabricating a multi-point array for large-area friction-induced micro / nano processing. Background technique [0002] Since the 21st century, the miniaturization revolution triggered by semiconductor microelectronics technology has entered a new era, which is the era of nanotechnology. Because nanotechnology runs through various fields and brings fundamental changes to old traditional technologies, it is called an upcoming technological revolution. Today, nanotechnology (NT), biotechnology (BT) and information technology (IT) have become the three most influential fields in the scientific and technological circles. Among them, nanotechnology occupies an increasingly important position in modern science and industry. [0003] Nano-manufacturing is the way to realize the transformation of nano-technology from functional principles to manufacturing principles, and it is also the basis for supporting nano-technology t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B81C1/00
Inventor 钱林茂陈磊吴治江余丙军周仲荣
Owner SOUTHWEST JIAOTONG UNIV