Method for manufacturing low layer number graphene film on silicon carbide substrate

A silicon carbide substrate, graphene film technology, applied in the direction of graphene, nano-carbon, etc., to achieve the effect of inhibiting sublimation and stable and controllable effective carbonization time

Active Publication Date: 2013-02-20
NO 55 INST CHINA ELECTRONIC SCI & TECHNOLOGYGROUP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Unlike epitaxial growth, the SiC thermal decomposition method cannot control the number of graphene film layers by adjusting the time and flow of the source.

Method used

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  • Method for manufacturing low layer number graphene film on silicon carbide substrate
  • Method for manufacturing low layer number graphene film on silicon carbide substrate
  • Method for manufacturing low layer number graphene film on silicon carbide substrate

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Embodiment

[0025] The provided method for growing a low-layer graphene film on a high-purity semi-insulating silicon carbide substrate with a positive crystal orientation (0001) silicon surface comprises the following steps:

[0026] 1) Select a high-purity semi-insulating silicon carbide substrate with a positive crystal orientation (0001) silicon surface, and place the substrate on a graphite base coated with tantalum carbide;

[0027] 2) The temperature of the system is raised to 1570°C, the pressure of the reaction chamber is set to 100mbar, and the surface of the substrate is treated online under the atmosphere of hydrogen flow rate of 80L / min and argon flow rate of 3L / min to remove surface damage and form micro steps, the processing time is 30 minutes;

[0028] 3) Reduce the temperature of the reaction chamber to 1200°C, and gradually reduce the flow of hydrogen from 80L / min to 0L / min, keep the flow of argon at 3L / min, set the pressure of the reaction chamber to 100mbar, and the pr...

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Abstract

The present invention relates to a method for manufacturing a low layer number graphene film on a silicon carbide substrate. The method comprises the following process steps: 1) selecting a silicon surface silicon carbide substrate, and placing on a graphite base having a tantalum carbide coating; 2) carrying out system heating; 3) reducing a reaction chamber temperature to less than 1200 DEG C; 4) increasing argon flow; 5) carrying out system heating; 6) reducing argon flow, and reducing reaction chamber pressure to 0-1 mbar; 7) continuously adopting a mechanical pump to control a reaction chamber vacuum degree; 8) adopting a molecular pump to control the reaction chamber vacuum degree, and starting a carbonization process; 9) closing heating, and introducing argon; 10) reducing the reaction chamber temperature to 1000 DEG C, and closing argon; and 11) reducing the reaction chamber temperature, introducing argon to the reaction chamber to achieve atmospheric pressure, opening the chamber, and taking the sheet. The method has the following advantages that: graphene film formation can be promoted, sublimation of silicon atoms in the SiC substrate during heating and cooling processes can be effectively inhibited, and the carbonization process is easily controlled so as to achieve low layer number graphene film preparation.

Description

technical field [0001] The invention proposes a method for manufacturing a low-layer graphene film on a silicon carbide substrate. The graphene film prepared by the method has a low layer number, good repeatability, and is stable and controllable. It belongs to the technical field of semiconductor materials. Background technique [0002] Graphene is a monoatomic layer graphite crystal film discovered by the Geim research group of the University of Manchester in 2004. It is a two-dimensional honeycomb substance composed of sp2 hybridized carbon atoms. It is the basic unit for constructing other dimensional carbon materials. It can wrap Roll up to form zero-dimensional fullerenes, roll up to form one-dimensional carbon nanotubes, and stack layers to form three-dimensional graphite. The C-C bond length of graphene is about 0.142nm. The perfect graphene is two-dimensional and only includes hexagonal cells (equiangular hexagons). It is the first two-dimensional crystal discovere...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B31/04C01B32/184
Inventor 李赟尹志军朱志明赵志飞陆东赛
Owner NO 55 INST CHINA ELECTRONIC SCI & TECHNOLOGYGROUP CO LTD
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