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116results about How to "Avoid sublimation" patented technology

Method for manufacturing low layer number graphene film on silicon carbide substrate

ActiveCN102936009AReduce the amount of residual hydrogenAvoid sublimationGrapheneCarbonizationGraphite
The present invention relates to a method for manufacturing a low layer number graphene film on a silicon carbide substrate. The method comprises the following process steps: 1) selecting a silicon surface silicon carbide substrate, and placing on a graphite base having a tantalum carbide coating; 2) carrying out system heating; 3) reducing a reaction chamber temperature to less than 1200 DEG C; 4) increasing argon flow; 5) carrying out system heating; 6) reducing argon flow, and reducing reaction chamber pressure to 0-1 mbar; 7) continuously adopting a mechanical pump to control a reaction chamber vacuum degree; 8) adopting a molecular pump to control the reaction chamber vacuum degree, and starting a carbonization process; 9) closing heating, and introducing argon; 10) reducing the reaction chamber temperature to 1000 DEG C, and closing argon; and 11) reducing the reaction chamber temperature, introducing argon to the reaction chamber to achieve atmospheric pressure, opening the chamber, and taking the sheet. The method has the following advantages that: graphene film formation can be promoted, sublimation of silicon atoms in the SiC substrate during heating and cooling processes can be effectively inhibited, and the carbonization process is easily controlled so as to achieve low layer number graphene film preparation.
Owner:NO 55 INST CHINA ELECTRONIC SCI & TECHNOLOGYGROUP CO LTD

Silicon carbide activation annealing method

The invention discloses a silicon carbide activation annealing method. The method comprises the following steps: forming a first protection layer on the surface, subjected to ion implantation, of oneside of a silicon carbide wafer; forming a second protective layer on the surface of one side, at which the first protective layer is formed, of the silicon carbide wafer; carrying out annealing treatment of the silicon carbide wafer with the second protection layer, wherein the thermal stability of the second protection layer is superior to that of the first protection layer during annealing treatment. A first protection layer and a second protection layer are formed on the surface of silicon carbide. During the annealing treatment of the silicon carbide wafer, the second protection layer canprevent the first protection layer from melting at a high temperature and prevents the sublimation of silicon atoms, and the first protection layer can effectively prevent silicon atoms on the surface of the silicon carbide wafer from sublimating and depositing again, so the problems of sublimation and deposition of silicon atoms on the surface of silicon carbide in the annealing process can be solved through the two protection layers, and the reliability of activating annealing protection of silicon carbide is improved.
Owner:WUXI CHINA RESOURCES MICROELECTRONICS

Processing method for high-quality aeronautic convenient hold Luo powder

The invention relates to a processing method for high-quality convenient hold Luo powder. The method disclosed by the invention comprises the following steps; mixing and mashing raw materials; performing steaming slices, extruding, short cutting, gelation, steaming, cooling, and shaping for sub-packaging on the raw materials; preparing seasoning sauce, spraying, quick-freezing, inspecting and packaging to obtain finished products. The method is simple in technology, little in equipment investment and short in processing cycles, and obtained products are convenient to eat and has storage resistant. On the basis of keeping the fresh mouth feel of rice flour, in the technology link, a spraying seasoning sauce and quick-freezing technology is adopted, the rice flour is directly heated, and the hold Luo power with rich cooking liquor is made in a fresh manner. The rice flour can keep soft and flexible mouth feel in aeronautic heating; for aeronautic food, the problem that cooking liquor products overflow in the transportation process is solved, the food safety is ensured, and in the aspect of quality, the quality guarantee period is prolonged. The method disclosed by the invention overcomes the defects of short quality guarantee period and the like caused by a traditional handmade technology, and the products are convenient to eat, so that the hold Luo power, as a traditional local dainty, gradually moves towards industrialized mass production.
Owner:SANYA YANGYUMING BIOTECH CO LTD

Middle-high temperature thermoelectric module

The invention relates to a middle-high temperature thermoelectric module. The middle-high temperature thermoelectric module comprises at least one group of thermoelectric pair, wherein the thermoelectric pair comprises two thermoelectric blocks connected through an insulating supporting plate; an electrode formed on a high temperature end surface of the thermoelectric pair; a diffusion blocking protection layer formed at least on the surface of the thermoelectric pair and/or the surfaces of the two thermoelectric blocks; an anti-oxidation layer formed at least on the surface of the thermoelectric pair and/or the surfaces of the two thermoelectric blocks; and an aerogel thermal insulation layer filling a gap of the at least one group of thermoelectric pair. The thermoelectric module provided by the invention simultaneously has the performance of sublimation prevention, anti-oxidation, heat insulation and the like, and the thermoelectric performance and the efficiency of the thermoelectric module are improved; in addition, the thermoelectric module has a self-protection function when working under conditions relating to corrosive gas, moist, chemical medium corrosion, temperature cold-hot alternation and the like.
Owner:SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI

Silicon carbide ion activation annealing device and silicon carbide ion activation annealing method

The invention discloses a silicon carbide ion activation annealing device and a silicon carbide ion activation annealing method; the silicon carbide ion activation annealing device comprises a high-temperature furnace and a graphite crucible; the wall of the high-temperature furnace is provided with an air inlet and an air outlet; the graphite crucible is arranged in a hearth of the high-temperature furnace; the graphite crucible is provided with an outer shell, an inner shell and a crucible cover; the inner part of the inner shell forms an inner hearth; and an outer hearth is formed between the outer shell and the inner shell; after the crucible cover is covered, the outer shell and the crucible cover are closed in a sealing way, and a gap exists between the top end of the inner shell andthe crucible cover; the silicon carbide ion activation annealing method comprises the following steps: a protective layer is coated on the silicon carbide to be annealed, and then the silicon carbideis placed in the inner hearth of the graphite crucible; high-purity silicon carbide powder is arranged in the outer hearth of the graphite crucible, inert gas is led in the inner hearth of the high-temperature furnace, and then the high-temperature furnace is used for heating to the temperature of 1200 DEG C to 1800 DEG C for 0.52 hours; meanwhile, the silicon carbide surface is smooth and the finished product ratio is improved.
Owner:NO 55 INST CHINA ELECTRONIC SCI & TECHNOLOGYGROUP CO LTD

Levelling agent and preparation method and application thereof

The invention relates to a levelling agent and a preparation method and an application thereof. A structural formula of the levelling agent is as shown in the following specification, wherein n is a number between 5 and 10. The levelling agent has the good film-forming property, and contains abundant ester groups, and is capable of combining with dye through a hydrogen bond, thereby uniformly carrying the dye to the surface of fabric and forming a film in uniform thickness, enabling the dye to be uniformly adhered to the fabric, and preventing the non-uniform dispersion because of the short contact time of the dye and the fabric. In addition, the film can also prevent migration and sublimation of the dye in a drying and color development process, and the chromatic aberration of a warp direction, a weft direction and positive and negative faces of the fabric is prevented. The levelling agent is suitable for continuous padding-type dyeing and coating-type dyeing. Compared with vat dyeingin high-temperature and high-pressure, the energy consumption can be reduced, the dyeing efficiency is improved, and the product quality is improved, the color fastness of the fabric and the color uniformity reach a A-grade level stated by a national standard, so the vat dyeing in high-temperature and high-pressure can be possibly replaced by the continuous dyeing in normal pressure and temperature.
Owner:SUZHOU TANGHUA NANO TECH
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