Nanocomposite material and its use in optoelectronics
A shell material and nanoparticle technology, applied in nanotechnology, photovoltaic power generation, nanotechnology, etc., can solve the problem of quantum dot size reduction
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Embodiment 1a
[0089] Example 1a : Direct synthesis of functionalized germanium nanocrystals followed by annealing at 400-500°C
[0090] The method is the same as that of Example 1 above, except that Ge is used instead of Si.
Embodiment 2
[0091] Example 2 : ZnO / Ti / Si / Ti / ZnO multilayer annealed between 800 and 1000°C.
[0092] This time, it was a more conventional approach, consisting of alternately depositing very thin films: [ZnO(3nm) / Ti(1nm) / Si(3nm) / Ti(1nm) / ZnO(3nm)] repeated 30 times. For simplicity, Figure 7 Only the alternation of four films is shown in . The Ti film has the effect of reducing the atmosphere in the deposition chamber. The basic multilayer was repeated 30 times, producing an absorber approximately 330 nm thick.
[0093] Annealing causes the Si to be deposited in the form of elongated grains with perfect control of their height. The aforementioned silicon is protected by oxidation of titanium and maintains a semiconductor state.
Embodiment 2a
[0094] Example 2a : ZnO / Ti / Ge / Ti / ZnO multilayer annealed between 800 and 1000°C.
[0095] The method is the same as in Example 2 above, but Ge is used instead of Si.
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