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Method for preparing solvent permeation nanoimprint micro-nano structure

A micro-nano structure and solvent technology, applied in the field of micro-nano structure preparation, can solve problems such as increasing the complexity of nano-imprint technology equipment, and achieve the effect of a wide range of applications

Inactive Publication Date: 2013-03-06
SHANGHAI NANOTECH PROMOTION CENT
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, whether it is UV nanoimprinting or thermal imprinting technology, corresponding ultraviolet light equipment or thermal pressing equipment is required, which in itself increases the complexity of nanoimprinting technology equipment.

Method used

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  • Method for preparing solvent permeation nanoimprint micro-nano structure
  • Method for preparing solvent permeation nanoimprint micro-nano structure
  • Method for preparing solvent permeation nanoimprint micro-nano structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] 1. Photoetching micron-scale templates to obtain silicon dioxide micron-scale photolithographic templates.

[0024] 2. Mix PDMS and curing agent evenly in a weight ratio of 10:1. After degassing for 20 minutes in a vacuum state, pour PDMS onto the surface of the photolithographic template, heat at 80°C for 2 hours, and cool naturally. The PDMS soft template Gently tear off the photolithographic template until the surface has a PDMS soft template with micron-scale structure patterns.

[0025] 3. Mix P3HT and o-dichlorobenzene at a ratio of 20 mg / ml to prepare a P3HT solution, and stir it electromagnetically at 50° C. for 4 hours to obtain a transparent red P3HT solution.

[0026] 4. Spin-coat the prepared P3HT solution to form a film on the cleaned and dried glass slide. The spin-coating parameters are: rotation speed 500rpm / min, acceleration 100rpm / s, and spin-coating time 60s.

[0027] 5. Gently touch the PDMS soft template to the P3HT solution film from one side, and...

Embodiment 2

[0030] 1. A PET grating structure with a pressing period of 750nm, a width of 350nm and a height of 150nm

[0031] 2. Mix PDMS and curing agent evenly in a weight ratio of 10:1. After degassing for 20 minutes in a vacuum state, pour PDMS onto the surface of the photolithographic template, heat at 80°C for 2 hours, and cool naturally. The PDMS soft template Gently tear off the PET template to obtain a PDMS soft template with a grating structure on the surface.

[0032] 3. Mix P3HT and o-dichlorobenzene at a ratio of 100 mg / ml to prepare a P3HT solution, and stir it electromagnetically at 50° C. for 4 hours to obtain a transparent red P3HT solution.

[0033] 4. Spin-coat the prepared P3HT solution to form a film on the cleaned and dried glass slide. The spin-coating parameters are: speed 1000rpm / min, acceleration 1000rpm / s, spin-coating time 30s.

[0034] 5. Gently touch the PDMS soft template to the P3HT solution film from one side, and then gradually cover the entire P3HT sol...

Embodiment 3

[0037] 1. The circular hole lattice structure with a pressing period of 800nm, a width of 400nm in diameter, a depth of 350nm, and a depth of 80nm

[0038] 2. Mix PDMS and curing agent evenly in a weight ratio of 10:1. After degassing for 20 minutes in a vacuum state, pour PDMS onto the surface of the photolithographic template, heat at 80°C for 2 hours, and cool naturally. The PDMS soft template Gently tear off the PET template to obtain a PDMS soft template with a rod-like structure on the surface.

[0039] 3. Mix P3HT and o-dichlorobenzene at a ratio of 50 mg / ml to prepare a P3HT solution, and stir it electromagnetically at 50° C. for 4 hours to obtain a transparent red P3HT solution.

[0040] 4. Spin-coat the prepared P3HT solution to form a film on the cleaned and dried glass slide. The spin-coating parameters are: speed 700rpm / min, acceleration 1000rpm / s, spin-coating time 30s.

[0041] 5. Gently touch the PDMS soft template to the P3HT solution film from one side, and ...

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Abstract

The invention discloses a nanoimprint method for preparing a micro-nano structure by a solvent permeation method. The nanoimprint method is characterized in that a micro-nano structure of a polymer solution is pre-formed by using the polymer solution and a silicon rubber (PDMS) soft template, and then due to permeation of a solvent in the polymer solution in the PDMS template, a polymer micro-nano structure can be formed by a polymer extraction method. The method for preparing the micro-nano structure is suitable for processing the micro-nano structure of various polymers and various polymer and nano particle blends; the limitation to a forming material is low; the application range is wide; during forming, ultraviolet or heating auxiliary solidification is not required; the forming equipment is simple; and the cost is low.

Description

technical field [0001] The invention relates to a method for preparing a micro-nano structure, which belongs to the field of micro-nano processing. Background technique [0002] With the development of electronic equipment towards miniaturization, light weight, low cost and multi-function, the processing technology of micro-nano structure is facing more and more challenges. Although the traditional lithography technology is mature, the cost of lithography equipment is high, and it is difficult to further reduce the processing size. Therefore, various other types of micro-nano processing technology have been vigorously developed as the next-generation lithography technology. Nanoimprint technology is one of them. Nano-imprinting uses a template with a nano-pattern to contact the polymer film on the substrate to press out a nano-scale pattern. Compared with traditional lithography, it has the following advantages: (1) Nano-imprinting relies on contact pressure instead of usin...

Claims

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Application Information

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IPC IPC(8): G03F7/00
Inventor 王金合闵国全宋志棠周伟民张静张燕萍
Owner SHANGHAI NANOTECH PROMOTION CENT