Photosensitive composition containing 4-(2,4,6-trimethyl benzene formyl) diphenyl sulfide as photoinitiator

A photosensitive composition and photoinitiator technology, applied in the field of photocuring, can solve the problems of small molecular weight of benzophenone, poor solubility, affecting material properties, etc., achieve excellent surface and deep curing properties, solve solubility problems, Simple preparation process

Inactive Publication Date: 2013-03-20
HANGZHOU INST OF ADVANCED MATERIAL BEIJING UNIV OF CHEM TECH
View PDF4 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, among the many photoinitiators that have been successfully commercially produced, benzophenone has become one of the most widely used photoinitiators due to its low price and good surface curing performance, but due to the small molecular weight of benzophenone, Therefore, it has the disadvantages of being volatile and prone to serious odor
In order to overcome the shortcomings of benzophenone's small molecular we

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive composition containing 4-(2,4,6-trimethyl benzene formyl) diphenyl sulfide as photoinitiator
  • Photosensitive composition containing 4-(2,4,6-trimethyl benzene formyl) diphenyl sulfide as photoinitiator

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0017] Example 1

[0018] A photosensitive composition comprising the following components:

[0019] (A) Photoinitiator (structure (I)) 5g;

[0020] (B) Triethanolamine 3g;

[0021] (C) TPGDA 52g;

[0022] (D) Epoxy acrylic resin 40g;

[0023] The preparation process of the composition is: under the condition of yellow light, add the components (A), (B), (C), (D) into a glass flask equipped with stirring, and stir the materials at room temperature until they are uniform. The photosensitive composition of the invention.

Example Embodiment

[0024] Example 2

[0025] A photosensitive composition comprising the following components:

[0026] (A) Photoinitiator (structure (I)) 3g;

[0027] (B) Triethanolamine 5g;

[0028] (C) TPGDA 52g;

[0029] (D) Epoxy acrylic resin 40g;

[0030] The preparation process of the composition is the same as in Example 1.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a photosensitive composition and an application of the photosensitive composition in photo-curing materials, belonging to the technical field of photo-curing. The photo-curing composition provided by the invention comprises the following components in parts by weight: 2-6 parts of 4-(2,4,6-trimethyl benzene formyl) diphenyl sulfide photoinitiator, 1-10 parts of organic amine assistant photoinitiator, 20-80 parts of ethylene unsaturated compound monomer and 20-80 parts of ethylene unsaturated compound prepolymer. The composition finished product has excellent surface and depth curing performances, high reaction activity, not only keeps the excellent performance of a common benzophenone composition, but also has no odor problem, solves a solubility problem of 4-phenyl benzophenone and 4-thiophenyl benzophenone, has a simple preparation process, does not generate smelly or pungent smell in a production process, does not generate insoluble substances and can be extensively applied to such fields as photocuring paint, printing ink, adhesive, photoresist and the like.

Description

technical field [0001] The invention relates to a photosensitive composition and its application in photocuring materials, belonging to the field of photocuring technology. Background technique [0002] UV curing technology has been widely used in coatings, inks, adhesives, photoresists and other fields. The photocurable composition in the UV curing system is mainly composed of three parts: monomer, prepolymer and photoinitiator. Among them, the photoinitiator is the most important factor affecting the photosensitive performance of the photocurable composition. When determining a photosensitive When formulating a polymer composition, finding a good photoinitiator is the key to technology. [0003] At present, among the many photoinitiators that have been successfully commercially produced, benzophenone has become one of the most widely used photoinitiators due to its low price and good surface curing performance, but due to the small molecular weight of benzophenone, There...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03F7/027G03F7/004
Inventor 胡春青宋国强李川
Owner HANGZHOU INST OF ADVANCED MATERIAL BEIJING UNIV OF CHEM TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap