Photosensitive composition containing 4-(2,4,6-trimethyl benzene formyl) diphenyl sulfide as photoinitiator
A photosensitive composition and photoinitiator technology, applied in the field of photocuring, can solve the problems of small molecular weight of benzophenone, poor solubility, affecting material properties, etc., achieve excellent surface and deep curing properties, solve solubility problems, Simple preparation process
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Embodiment 1
[0018] A photosensitive composition comprising the following components:
[0019] (A) photoinitiator (structural formula (I)) 5g;
[0020] (B) Triethanolamine 3g;
[0021] (C) TPGDA 52g;
[0022] (D) 40g epoxy acrylic resin;
[0023] The preparation process of the composition is as follows: under the condition of yellow light, add (A), (B), (C) and (D) components into a glass flask equipped with stirring, and stir the materials at room temperature until they are uniform, and the present product is obtained. Invented photosensitive composition.
Embodiment 2
[0025] A photosensitive composition comprising the following components:
[0026] (A) photoinitiator (structural formula (I)) 3g;
[0027] (B) Triethanolamine 5g;
[0028] (C) TPGDA 52g;
[0029] (D) 40g epoxy acrylic resin;
[0030] The composition preparation process is the same as in Example 1.
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