LED chip cutting method and LED chip manufactured by same

A technology of LED chip and cutting method, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as unfavorable light extraction, and achieve the effect of improving light extraction efficiency

Inactive Publication Date: 2013-04-03
FOCUS LIGHTINGS SCI & TECH
4 Cites 13 Cited by

AI-Extracted Technical Summary

Problems solved by technology

[0002] Generally, after the introduction of sidewall corrosion in the sapphire substrate LED chip process, the wafer will be split directly af...
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Abstract

The invention discloses an LED chip cutting method on the basis of side-wall corrosion. The LED chip cutting method includes that an LED wafer is subjected to front laser scribing and side-wall corrosion and then is manufactured to form a chip according to a normal LED chip manufacturing process; back laser hidden cutting is carried out after the wafer is subjected to thinning and back plating, and positioning of hidden cutting lines is controlled, so that the hidden cutting lines are staggered from front scribing lines; and an oblique fracture surface is formed on each side wall of a crystal grain under the induction action of stress during fracturing, lateral light emergence is facilitated, the integral luminous flux of the chip is increased, and the appearance and the electric performance of the chip are unaffected. The invention further discloses the LED chip manufactured by the LED chip cutting method. Edges of the LED chip are in the shape of 'Z'-shaped sections with the oblique fracture surfaces. The 'Z'-shaped sections are manufactured by means of laser hidden cutting after the GaN wafer which is a semiconductor substrate is subjected to a chip side-wall corrosion process, accordingly, quantities of emergent light on the side walls are increased, and the brightness of the integral LED chip is improved.

Application Domain

Technology Topic

Laser scribingCrystallite +7

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  • LED chip cutting method and LED chip manufactured by same
  • LED chip cutting method and LED chip manufactured by same

Examples

  • Experimental program(1)

Example Embodiment

[0015] The preferred embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings, so that the advantages and features of the present invention can be more easily understood by those skilled in the art, so as to define the protection scope of the present invention more clearly.
[0016] See attached figure 1 with attached figure 2 As shown, a method for cutting LED chips is provided in this implementation, including the following steps:
[0017] (1) Provide a sapphire substrate 2 with a GaN epitaxial light-emitting layer 1, perform laser scribing on the front side of the sapphire substrate 2 to form grooves 4 to divide the crystal grains, and use wet etching to etch the laser ablation area to form a groove in the groove Form a rough surface 7, according to the traditional chip manufacturing process, on this basis to complete the follow-up manufacturing of the chip;
[0018] (2) Thinning and polishing the sapphire substrate 2, and then coating the back reflector 3;
[0019] (3) After the above process is completed, laser stealth cutting is performed on the back of the sapphire substrate 2, and the cutting position is staggered in the horizontal direction from the groove 4 on the front of the sapphire substrate 2, such as figure 1 shown;
[0020] (4) Split the chip along the invisible cutting position. At this time, split along the bottom of the groove on the front of the sapphire substrate and the invisible cutting position on the back of the sapphire substrate to form a "ㄣ"-shaped section with an oblique crack 6, like figure 2 As shown in the figure, the position selection scheme of the laser stealth cutting blasting point 5 is shown in the figure.
[0021] It should be noted, figure 2 What is shown is only to make the oblique cracked surface 6 in one direction of the crystal grain. With the same process, the same oblique cracked surface 6 effect can be produced in the other direction, and the brightening effect of this process will be doubled. See attached figure 2 , the ray a that cannot come out due to the total reflection effect will be taken out at the oblique crack; in addition, the invisible cut will form a rough sapphire section, which will also increase the amount of light emitted, such as ray b.
[0022] It is worth noting that the stealth cutting position and depth can be adjusted to control the size and inclination of the oblique crack surface to meet the needs of chips of different sizes. Compared with small-sized chips, the angle between the light incident on the side and the side is larger for large-sized chips, so the inclination angle of the oblique crack surface of the "ㄣ"-shaped cross-section decreases with the increase of chip size, and a gentler oblique surface is produced. The cracked surface minimizes the incident angle of light and increases the outgoing light. The inclination angle of the oblique split surface of the "ㄣ"-shaped section can be reduced by reducing the cutting position on the back of the semiconductor substrate and the staggered distance between the groove on the front of the semiconductor substrate in the horizontal direction; or by reducing the cutting position on the back of the semiconductor substrate. depth to reduce the inclination angle of the oblique crack surface of the "ㄣ" shaped section.
[0023] Since the front crystal grains have been divided, the oblique cracks made by this process will not affect the epitaxial layer, and the electrical properties of the chip will not be affected. At the same time, the oblique split surface is much smaller than the size of the chip, so it will not affect the front appearance of the chip. In addition, the material of the semiconductor substrate in this embodiment also includes zinc oxide, gallium nitride or silicon carbide materials.
[0024] The above embodiments are only to illustrate the technical concept and characteristics of the present invention. All equivalent changes or modifications are within the protection scope of the present invention.
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