Silicon substrate differential motion quartz acceleration sensor

An acceleration sensor, silicon-based technology, used in the measurement of acceleration, speed/acceleration/shock measurement, instruments, etc., can solve the problems of large sensor volume, no overload protection structure, and self-locking, etc., to achieve high sensitivity and overload protection. And the effect of high quality factor and small size

Inactive Publication Date: 2013-04-24
XI AN JIAOTONG UNIV
View PDF3 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The first type has a compact structure, the sensor is small in size, but there is a self-locking phenomenon, and there is no overload protection structure
The foun...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Silicon substrate differential motion quartz acceleration sensor
  • Silicon substrate differential motion quartz acceleration sensor
  • Silicon substrate differential motion quartz acceleration sensor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0014] The structure and working principle of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0015] see figure 1 , a silicon base differential quartz acceleration sensor, including two silicon bases 1 installed in opposite directions and double-ended fixed quartz tuning forks 3, the silicon base 1 is composed of a flexible silicon beam 2 and a mass block 4, the mass on the silicon base 1 The block 3 is connected to the silicon base 1 through two flexible beams 2, one support 13 of the double-ended quartz tuning fork 3 is fixed on one end of the silicon base 1, and the other support 13 is fixed on the mass block 4, and the double-ended quartz tuning fork 3 is fixed on the silicon base 1. The two tines 15 of the tuning fork 4 are connected to the support 13 through the fixed end 14, the tines 15 are surrounded by electrodes, the silicon base 1 is sandwiched between the upper overload protection plate 10 and the lower over...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A silicon substrate differential motion quartz acceleration sensor comprises two silicon substrates which are installed in the opposite directions and two-end-fixed quartz tuning forks, the silicon substrates are clamped between an upper overload protection plate and a lower overload protection plate, a structure formed by the silicon substrates, the two-end-fixed quartz tuning forks, the upper overload protection plate and the lower overload protection plate is placed in a hole of a circuit board, the two-end-fixed quartz tuning forks penetrate through through holes of the upper overload protection plate and are connected to the circuit board through gold wires, an inverse piezoelectric effect exists in the two-end-fixed quartz tuning forks, a circuit is adopted to inspire vibration, when acceleration acts on mass blocks supported by flexibility silicon beams, a differential motion structure is formed by the two two-end-fixed quartz tuning forks, and an output signal of the sensor is the difference of the frequency of the two two-end-fixed quartz tuning forks. When the temperature changes, the two two-end-fixed quartz tuning forks are pulled or pressed simultaneously, frequency changes are identical, the temperature affect can be offset through the subtraction of the frequency changes, the silicon substrate differential motion quartz acceleration sensor has the advantages of being small in size, light in weight and high in digital signal output and resolution ratio.

Description

technical field [0001] The invention belongs to the technical field of micro-mechanical electronics, and in particular relates to a silicon-based differential quartz acceleration sensor. Background technique [0002] High-precision digital navigation systems have been widely used in aircraft, missiles, and underwater driving. As an important part of the digital navigation system, the acceleration sensor with frequency output characteristics has more and more strict requirements on its high precision and high resolution. The output of this type of accelerometer is a frequency signal without the loss of accuracy caused by digital-to-analog conversion. Sensors in this area mainly include silicon microresonant sensors and quartz resonant acceleration sensors. The processing technology of silicon microresonant sensor based on MEMS is complex and the resolution is low. Such acceleration sensors generally use electrostatic excitation, and the design of the excitation structure i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01P15/097
Inventor 赵玉龙李村饶浩
Owner XI AN JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap