Gas mixing and distributing structure of double-chamber or multi-chamber thin film deposition equipment
A technology of thin film deposition and gas mixing, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of high cost, complex structure, large space occupation, etc., and achieve convenient installation and maintenance, low cost, The effect of taking up little space
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[0016] The present invention will be described in further detail below with reference to the drawings.
[0017] Such as figure 1 , figure 2 As shown, the present invention includes a gas mixing chamber 1, a gas inlet pipeline, a gas outlet pipeline, and an air inlet baffle 6. The gas mixing chamber 1 is an axisymmetric geometric body, such as a rectangular parallelepiped or a cylinder. The gas mixing chamber 1 can be The integrated structure can also be a horizontally split structure. The air mixing chamber 1 of this embodiment is a horizontally split structure, divided into an upper part 11 of the air mixing chamber and a lower part 12 of the air mixing chamber, and the middle is sealed by a sealing rubber ring 13 connection.
[0018] A first gas inlet pipe 4 and a second gas inlet pipe 5 are connected to the bottom surface of the lower half 12 of the gas mixing chamber. The first gas inlet pipe 4 and the second gas inlet pipe 5 are connected to the gas mixing chamber 1 respecti...
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