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Small light spot off-axis aligning system based on beam splitting deflection structure

An alignment system and beam splitting technology, applied in the field of lithography, can solve problems affecting signal accuracy, signal deformation, alignment errors, etc., and achieve high alignment accuracy, solution compatibility, and low noise effects

Active Publication Date: 2013-06-05
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

use Figure 4 scheme, the period of the reference grating is obviously inconsistent with the period imaged by the marker (8.0 marker branch ± 1 imaging period is 8.0 μm, 8.8 marker branch ± 1 order light imaging period is 8.8 μm, and the reference grating is 8.4 μm), which It will cause deformation of the signal, affect the accuracy of the signal, and cause alignment errors

Method used

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  • Small light spot off-axis aligning system based on beam splitting deflection structure
  • Small light spot off-axis aligning system based on beam splitting deflection structure
  • Small light spot off-axis aligning system based on beam splitting deflection structure

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Embodiment Construction

[0027] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0028] Figure 5Shown is a structural block diagram of the alignment system adopted according to the present invention, the alignment system includes: a light source and illumination module 1, an imaging module 2, a reference grating 3, a signal acquisition and processing module 4, an alignment mark 5, and a motion table 7. Position acquisition and motion control module 8. Alignment operation and management module 9. The light source and illumination module 1 provide illumination light beams to irradiate the alignment marks 5 on the silicon wafer 6 to form diffracted light carrying mark information, and the diffracted light is imaged onto the surface of the reference grating 3 by the imaging module 2 . The position acquisition and motion control module 8 collects the position information of the motion table 7 carrying the silicon wafer 6, and...

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Abstract

Provided is aligning system of photoetching equipment. A beam splitting deflection structure is arranged in an imaging module and used for enabling +1 level light and -1 level light of each mark branch of an aligning mark to form beam splitting and deflection, and then the light is respectively subjected to imaging in a coherent mode on branch gratings of a reference grating. During aligning, according to the scanned mark branches, signals on the corresponding reference branch gratings are selectively used. According to the aligning system, the advantages that introduced noise is low, and aligning accuracy is high in a small light spot lighting technology are kept, and problem of compatibility of the reference branch grating is solved.

Description

technical field [0001] The invention relates to the field of photolithography, in particular to a small spot off-axis alignment system based on a beam splitting deflection structure for a photolithography device. Background technique [0002] In the manufacturing process of semiconductor IC integrated circuits, a complete chip usually needs to undergo multiple photolithography exposures before it can be completed. Except for the first photolithography, the photolithography of other levels must be accurately positioned before exposure, so as to ensure the correct relative position between the graphics of each layer. Instant overlay accuracy. Normally, the overlay accuracy is 1 / 3 to 1 / 5 of the resolution index of the lithography machine. For a 100nm lithography machine, the overlay accuracy index is required to be less than 35nm. Overlay accuracy is one of the main technical indicators of a projection lithography machine, and the alignment accuracy between the mask and the s...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F9/00G03F7/20
Inventor 李运锋宋海军
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD