Multilayer symmetric metamaterial based on phase-change material or topological insulating material
A technology of topological insulation and phase change materials, applied in electrical components, antennas and other directions, can solve the problems of complex tuning devices, difficult to apply tuning methods, increasing the complexity of metamaterial structure design and the difficulty of preparation process, etc.
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[0018] First, an N (N>=1) layer multilayer structure (metal layer 3-phase change material or topological insulating material layer 4-metal layer 3-oxidation layer 5) 2 is formed on the glass substrate 1 by a material growth process, such as attached figure 2 (a) shown.
[0019] Second, deposit SiO on the multilayer structure 2 2 film as a mask 6, as attached figure 2 (b) shown.
[0020] Then, the designed resonant cell array is transferred to the mask through the mask process, as shown in the attached figure 2 (c) shown. Among them, the structure design can adopt algorithms such as finite time domain difference method and finite element method.
[0021] Then, through an etching process, a resonant unit array 7 is prepared on the 2 material, and the resonant unit array is arranged in a rectangular lattice (that is, on the surface of the metamaterial, the horizontal period length L of the resonant unit x and vertical cycle length L y unequal) simultaneously penetrate t...
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