High-modal small-mass bearing piece platform of photoetching machine
A technology for a wafer stage and a lithography machine, which is applied in the field of lithography machines, can solve problems such as difficulty in improving and complicated manufacturing processes, and achieve the effects of reducing manufacturing risks, controlling processing costs, and reducing quality
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[0036] In order to better understand the technical content of the present invention, specific embodiments are given together with the attached drawings for description as follows.
[0037] This patent relates to the invention of a light-weight perforated wafer carrier for a lithography machine. like figure 1 Shown is a schematic diagram of the structure of the micro-motion stage of the workpiece table, wherein the carrier 1 is the main structural part of the micro-motion stage, the carrier 1 is installed on the top of the micro-motion stage, and the plane vector motor 2, the vertical drive mechanism 3 and the Differential sensor4.
[0038] Please refer to figure 2 figure 2 Shown is a cross-sectional view of the internal structure of the wafer table in a preferred embodiment of the present invention. The present invention proposes a high-mode light-weight wafer carrier for a lithography machine, including: a top structure module 11 of the wafer platform and a sealing plat...
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Abstract
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