Annealing apparatus and annealing process

An annealing device and annealing process technology, applied in ohmic resistance heating devices, electrical components, semiconductor/solid-state device manufacturing, etc., can solve the problems of long annealing time, large damage to the substrate, single function of the annealing device, etc., and achieve the goal of improving annealing efficiency Effect

Active Publication Date: 2013-10-02
BOE TECH GRP CO LTD +1
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0003] The traditional annealing device generally has a single function, and the annealing time is relatively long; the traditional annealing device uses heating wires or halogen lamps to heat, which causes relatively large damage to the substrate

Method used

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  • Annealing apparatus and annealing process
  • Annealing apparatus and annealing process
  • Annealing apparatus and annealing process

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Embodiment Construction

[0033] The structure and principle of the present invention will be described in detail below in conjunction with the accompanying drawings, and the examples given are only used to explain the present invention, not to limit the protection scope of the present invention.

[0034] Such as figure 1 , image 3 As shown, the present embodiment provides an annealing device, comprising:

[0035] A temperature gradient preheating unit 100, configured to perform gradient preheating on the substrate 600 to be annealed with gradient temperatures;

[0036] The high temperature unit 300 is used to heat the preheated substrate 600 at high temperature;

[0037] The moving device is used for transporting the substrate 600 from the temperature gradient preheating unit 100 to the high temperature unit 300 when the substrate 600 undergoes gradient preheating and / or after preheating.

[0038] The substrate 600 is preheated by gradient heating, which improves the annealing efficiency.

[0039...

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Abstract

The invention relates to an annealing apparatus and an annealing process. The annealing apparatus comprises a temperature gradient preheating unit which is used for performing gradient heating on a to-be-annealed substrate by using gradient temperatures, a high temperature unit which is used for performing high-temperature heating on the preheated substrate, a moving apparatus which is used for transporting the substrate to the high temperature unit from the temperature gradient preheating unit during the gradient preheating of the substrate and/or after the preheating of the substrate. The beneficial effects of the annealing apparatus and the annealing process are that since the method of gradient heating is adopted and preheating processing is conducted on the substrate, the annealing efficiency is improved; since a plasma induction unit and the electromagnetic field auxiliary high temperature unit are added, multiple functions are integrated and the annealing efficiency is further improved.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to an annealing device and an annealing process. Background technique [0002] Flat panel display technology makes our life rich and colorful. With the improvement of people's living standards, people's requirements for display quality are getting higher and higher. Liquid crystal display (LCD) technology has been very mature. Its products include mobile phones, cameras, monitors, flat panels Computers, TVs, outdoor displays, etc. People's large demand for display products objectively promotes the development of display technology, and new display technologies emerge in endlessly. The active layer of the thin film transistor (Thin Film Transistor, TFT) of the traditional liquid crystal display is made of amorphous silicon (a-Si) material, because the amorphous silicon itself has certain problems, such as the low on-state current and the mobility caused by too many de...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/324
CPCH05B3/0047H01L21/324H01L21/67115H01L21/6776
Inventor 王祖强
Owner BOE TECH GRP CO LTD
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