General mask and application thereof

A mask plate and lithography machine technology, which is applied to the photolithography process of the pattern surface, the original used for photomechanical processing, and the photolithography process exposure device, etc., can solve the problem of not providing a lithography machine mask, etc. fully compatible
CN103376645AActive Publication Date: 2013-10-30WUXI CHINA RESOURCES HUAJING MICROELECTRONICS
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
WUXI CHINA RESOURCES HUAJING MICROELECTRONICS
Publication Date
2013-10-30

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Abstract

The invention discloses a general mask for the exposure operation of at least two lithography machines. The general mask comprises a plurality of first mask alignment marks and a plurality of second mask alignment marks, wherein a first mask is used for exposing a first lithography machine; a second mask is used for exposing a second lithography machine. According to the general mask, the alignment sheathing operation between an advanced semiconductor material lithography (ASML) stepped lithography machine and a NIKON stepped lithography machine can be realized.
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Description

technical field

[0001] The present invention relates to semiconductor technology, and in particular to photolithographic processes and devices used in the manufacture of integrated circuits. Background technique

[0002] Photolithography is one of the most important processes in the manufacturing process of integrated circuits. In the silicon wafer manufacturing process, photolithography accounts for about one-third of all costs. Generally, the number of photolithography times and the number of masks required can indicate the difficulty of the integrated circuit production process. A typical silicon integrated circuit process includes more than 15 reticles.

[0003] The main equipment used in the lithography process includes lithography machines, and its main manufacturers include ASML (ASML), NIKON (Nikon) and CANON (Canon). Among them, ASML stepper and NIKON stepper are two main semiconductor exposure equipment. There are both ASML steppers and NIKON steppers on the prod...

Claims

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