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Display device, signal substrate of naked eye 3D function panel and manufacturing method of signal substrate

A technology for functional panels and display devices, applied in electrode manufacturing, printed circuit manufacturing, semiconductor/solid-state device manufacturing, etc. The effect of production efficiency, shortening the process flow, and reducing the production cost

Active Publication Date: 2013-11-06
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] To sum up, the manufacturing of 3D barrier signal glass in the prior art adopts a three-layer structure of signal line metal layer, passivation layer, and ITO transparent conductive layer. Each layer structure needs to be independently designed with a mask and three photolithography procedures are required. Many, affecting product production efficiency and increasing production costs

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  • Display device, signal substrate of naked eye 3D function panel and manufacturing method of signal substrate
  • Display device, signal substrate of naked eye 3D function panel and manufacturing method of signal substrate
  • Display device, signal substrate of naked eye 3D function panel and manufacturing method of signal substrate

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Embodiment Construction

[0029] Embodiments of the present invention provide a signal substrate of a naked-eye 3D functional panel, a manufacturing method thereof, and a display device, which are used to improve device utilization and product production efficiency, and reduce production costs.

[0030] A detailed introduction to the technical solutions provided by the embodiments of the present invention is given below.

[0031] see Figure 4 , a method for manufacturing a signal substrate of a naked-eye 3D functional panel provided by an embodiment of the present invention, the method includes the steps of:

[0032] S101, forming a transparent electrode film on the substrate, and forming a passivation layer on the transparent electrode film;

[0033] S102, forming a transparent electrode and a passivation layer via hole through a patterning process, and the via hole is used to connect the transparent electrode and the signal line;

[0034] It can be understood that: the patterning process may includ...

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Abstract

The invention discloses a signal substrate of a naked eye 3D function panel, a manufacturing method of the signal substrate and a display device. According to the signal substrate of the naked eye 3D function panel, the manufacturing method of the signal substrate and the display device, equipment utilization rate and product production efficiency are improved, and production cost is reduced. The manufacturing method of the signal substrate includes that a transparent electrode film is formed on the substrate, and a passivation layer is formed on the transparent electrode film; a transparent electrode and a passivation layer through hole are formed through a composition technology, and the through hole is used for connecting the transparent electrode and a signal line; the signal line is manufactured, and the signal line is connected with the transparent electrode through the through hole.

Description

technical field [0001] The invention relates to the technical field of displays, in particular to a signal substrate of a naked-eye 3D functional panel, a manufacturing method thereof, and a display device. Background technique [0002] The methods for manufacturing the signal substrate (3D barrier signal glass) of the naked-eye 3D functional panel in the prior art include: [0003] Referring to Fig. 1(a) and Fig. 1(b), the signal line metal layer is deposited on the entire glass substrate 10, and the first mask plate ( The pattern on the mask) is etched for the first time and the photoresist is removed to form a signal line metal electrode 11, wherein the signal line metal electrode 11 is a ring electrode; [0004] Referring to Fig. 2(a) and Fig. 2(b), a passivation layer (passivation) 21 is deposited on the entire glass substrate 10, and a second mask is formed on the photoresist layer after the second coating, exposure and development After the second etching, the passi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/77H01L21/768H01L27/12G02F1/1362G02B30/30
CPCG02F1/136286H05K1/0306H05K3/064H05K2201/0108H05K2201/10136H05K1/0284H05K1/115H05K2201/0326Y02E60/10G02B30/30G02B30/27B33Y10/00B33Y80/00H01M4/02H01M4/0404H05K1/0296H05K1/09
Inventor 郭会斌王守坤刘晓伟朱夏明郭总杰
Owner BOE TECH GRP CO LTD