Method of evaluating inhibition of CCOS (computer controlled optical surfacing) process on errors under different frequencies

An evaluation method, 1.CCOS technology, applied in the direction of grinding/polishing equipment, workpiece feed movement control, manufacturing tools, etc., can solve the problems such as difficult application of high-frequency errors, and achieve the comparison of error suppression capabilities in different frequency bands Effect

Inactive Publication Date: 2013-11-20
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
View PDF2 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For low-frequency surface errors, Zernike polynomials, PV values ​​and RMS values ​​can be used to accurately describe them, and they can be eliminated by controlling the dwell time of the local area of ​​CCOS processing technology. However, the above methods are difficult to apply to small-scale medium-high frequency errors

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method of evaluating inhibition of CCOS (computer controlled optical surfacing) process on errors under different frequencies
  • Method of evaluating inhibition of CCOS (computer controlled optical surfacing) process on errors under different frequencies
  • Method of evaluating inhibition of CCOS (computer controlled optical surfacing) process on errors under different frequencies

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0025] Such as figure 1 It shows the surface shape error distribution map obtained by the detection of flat glass ceramics before polishing in the embodiment of the present invention; the method utilizes the consistency of the correction process of surface shape error in CCOS polishing and the two-dimensional filtering process in signal processing in the mathematical model To analyze the ability of the CCOS polishing process to suppress errors in different frequency bands from the perspective of spatial spectrum, firstly, a mathematical model of smooth spectral function is established based on the convolution model of material removal and power spectral density function, and then the optical components before and after pol...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a method of evaluating the inhibition of CCOS (computer controlled optical surfacing) process on errors under different frequencies. The method includes the steps of S1, building a formula (1), PSDaft=(1-H)(1-H)<*>*PSDbef, for smoothing spectral function H, PSDaft and PSDbef according to the power spectral density functions PSDbef and PSDaft before and after optical element polishing, with (1-H)<*> being a conjugate to (1-H) and the symbol * being an operator used for obtaining the conjugate; S2, subjecting the formula (1) to bilateral modulo operation according to complex operation algorithms to obtain a power spectral density function expression (2), PSDaft=|(1-H)|2*PSDbef, for polished surface shape data; S3, solving the formula (2) according to |H|<1 due to the fact that the smoothing spectral function H is for Fourier transform after function normalization is removed, thus establishing a smoothing spectral function H formula (3); expressing the inhibition of the PCCOS process on errors under different frequencies as a frequency normalization function, calculating smoothing spectral function curves according to the PSDbef and PSDaft obtained before and after polishing, and evaluating the magnitude of the inhibition of the CCOS process on the errors under different frequencies according to values of the smoothing spectral function curves.

Description

technical field [0001] The invention belongs to the technical field of optical precision detection, and in particular relates to an evaluation method for the ability of CCOS polishing technology to suppress errors in different frequency bands. Background technique [0002] In high-precision optical systems, the influence of errors in different frequency bands on the surface of optical components on the performance of the optical system has attracted more and more attention. Low-frequency errors distort the image of the imaging system and introduce various aberrations; intermediate-frequency errors cause light to scatter at small angles. As a result, flares are generated in the imaging, which affects the contrast of the image; high-frequency errors cause light to scatter at a large angle and reduce the reflectivity of the mirror; therefore, it is particularly important to control the surface manufacturing errors of optical components by frequency division. For low-frequency s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B24B49/00
Inventor 王佳范斌万勇建施春燕卓彬孟凯
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products