Nano yttrium oxide modified sulfonated polyphenylene sulfide proton exchange membrane and preparation method thereof
A technology of sulfonated polyphenylene sulfide and proton exchange membrane, applied in electrochemical generators, climate sustainability, final product manufacturing, etc., can solve environmental pollution, decrease in proton conductivity, and limit the application of perfluorosulfonic acid membranes and other problems, to achieve the effect of high conductivity, good alcohol resistance and low preparation cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0023] 1. Preparation of SPPS film-making solution: DMF was used as the film-making solution, and the ground SPPS material with a sulfonation degree of 65.2% was dissolved in the film-making solvent to prepare a film-making solution with a mass percentage of SPPS of 10%.
[0024] 2.SPPS / Nano Y 2 o 3 Preparation of film-making solution: in the SPPS film-making solution obtained in step 1, add nanometer Y at a dose of 5% by mass 2 o 3 powder with a particle size of 60 nm. Stir with a magnetic stirrer at 30 °C for 4 h and at 75 °C for 6 h to make the nano-Y 2 o 3 The powder is uniformly dispersed in the film-making solution to obtain SPPS / nano Y 2 o 3 Membrane solution.
[0025] 3.SPPS / Nano Y 2 o 3 Preparation of proton exchange membrane: pour the mixed membrane-making liquid obtained in step 2 into a clean flat mold to form a membrane. The mixed film-making solution in the mold volatilizes the solvent at 50 °C to obtain SPPS / Y 2 o 3 wet film. The wet film was first ...
Embodiment 2
[0043] 1. Preparation of SPPS film-making solution: DMF was used as the film-making solution, and the ground SPPS material with a sulfonation degree of 68.7% was dissolved in the film-making solvent to prepare a film-making solution with a mass percentage of SPPS of 10%.
[0044] 2.SPPS / Nano Y 2 o 3 Preparation of film-making solution: in the SPPS film-making solution gained in step 1, add nanometer Y at a dose of 8% by mass 2 o 3 powder with a particle size of 70 nm. Stir with a magnetic stirrer at 30 °C for 4 h and at 75 °C for 6 h to make the nano-Y 2 o3 The powder is uniformly dispersed in the film-making solution to obtain SPPS / nano Y 2 o 3 Membrane solution.
[0045] 3.SPPS / Nano Y 2 o 3 Preparation of proton exchange membrane: pour the mixed membrane-making liquid obtained in step 2 into a clean flat mold to form a membrane. The mixed film-making solution in the mold volatilizes the solvent at 50 °C to obtain SPPS / Y 2 o 3 wet film. The wet film was first drie...
Embodiment 3
[0054] 1. Preparation of SPPS film-making solution: DMF was used as the film-making solution, and the ground SPPS material with a sulfonation degree of 72.1% was dissolved in the film-making solvent to prepare a film-making solution with a mass percentage of SPPS of 20%.
[0055] 2.SPPS / Nano Y 2 o 3 Preparation of film-making solution: In the SPPS film-making solution obtained in step 1, add nanometer Y at a dose of 12.5% by mass 2 o 3 powder with a particle size of 80 nm. Stir with a magnetic stirrer at 30 °C for 4 h and at 75 °C for 6 h to make the nano-Y 2 o 3 The powder is uniformly dispersed in the film-making solution to obtain SPPS / nano Y 2 o 3 Membrane solution.
[0056] 3.SPPS / Nano Y 2 o 3 Preparation of proton exchange membrane: pour the mixed membrane-making liquid obtained in step 2 into a clean flat mold to form a membrane. The mixed film-making solution in the mold volatilizes the solvent at 50 °C to obtain SPPS / Y 2 o 3 wet film. The wet film was f...
PUM
Property | Measurement | Unit |
---|---|---|
particle diameter | aaaaa | aaaaa |
particle diameter | aaaaa | aaaaa |
particle diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com