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Method for treating chlorosilane waste gas through reaction distillation technology

A technical treatment and reactive distillation technology, which is applied in the field of chlorosilane waste gas treatment by reactive distillation technology, can solve problems such as chlorosilane waste gas treatment, and achieve the effects of reducing the discharge of three wastes, reducing pressure, and improving utilization

Active Publication Date: 2014-02-05
XINTE ENERGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] CN103086380A proposes a method and equipment for reactive distillation treatment of dichlorodihydrosilane waste, which can realize the treatment of dichlorodihydrosilane waste, but does not treat chlorosilane waste gas

Method used

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  • Method for treating chlorosilane waste gas through reaction distillation technology

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] Reactive distillation system to treat chlorosilane waste gas 200Nm 3 / h.

[0024] Dichlorosilane: 1600kg / h, 40℃, 600kPaG

[0025] Silicon tetrachloride: 2700kg / h, 40℃, 600kPaG

[0026] Chlorosilane waste gas: 200Nm 3 / h, 40℃, 180kPaG

[0027] The operating pressure of the reactive distillation tower is 50kPaG, the pressure drop of the whole tower is 30 kPa, the output at the top of the tower is 4500kg / h, the return flow at the top of the tower is 45000 kg / h, the diameter of the tower is 2200mm, and the catalyst is 0.3m 3 / m 3 Packing, packing heights of rectification section, reaction section and stripping section are: 7.2m, 12.45m, 7.2m respectively. The feeding position of dichlorodihydrosilane and chlorosilane waste gas is at the bottom of the reaction section, and the feeding position of silicon tetrachloride and circulating materials is at the top of the reaction section.

[0028] The operation data shows: the temperature at the top of the tower is 45°C, the ...

Embodiment 2

[0030] Reactive distillation system to treat chlorosilane waste gas 200Nm 3 / h.

[0031] Dichlorosilane: 1600kg / h, 40℃, 600kPaG

[0032] Silicon tetrachloride: 2700kg / h, 40℃, 600kPaG

[0033] Chlorosilane waste gas: 200Nm 3 / h, 0℃, 180kPaG

[0034] The operating pressure of the reactive distillation tower is 50kPaG, the pressure drop of the whole tower is 30 kPa, the output at the top of the tower is 4500kg / h, the return flow at the top of the tower is 45000 kg / h, the diameter of the tower is 2200mm, and the catalyst is 0.3m 3 / m 3 Packing, packing heights of rectification section, reaction section and stripping section are: 7.2m, 12.45m, 7.2m respectively. The feeding position of dichlorodihydrosilane and chlorosilane waste gas is at the bottom of the reaction section, and the feeding position of silicon tetrachloride and circulating materials is at the top of the reaction section.

[0035] The operation data shows: the temperature at the top of the tower is 55°C, the t...

Embodiment 3

[0037] Reactive distillation system to treat chlorosilane waste gas 200Nm 3 / h.

[0038] Dichlorosilane: 1600kg / h, 40℃, 600kPaG

[0039]Silicon tetrachloride: 2700kg / h, 40℃, 600kPaG

[0040] Chlorosilane waste gas: 200Nm 3 / h, 60℃, 180kPaG

[0041] The operating pressure of the reactive distillation tower is 50kPaG, the pressure drop of the whole tower is 30 kPa, the output at the top of the tower is 4500kg / h, the return flow at the top of the tower is 45000 kg / h, the diameter of the tower is 2200mm, and the catalyst is 0.3m 3 / m 3 Packing, packing heights of rectification section, reaction section and stripping section are: 7.2m, 12.45m, 7.2m respectively. The feeding position of dichlorodihydrosilane and chlorosilane waste gas is at the bottom of the reaction section, and the feeding position of silicon tetrachloride and circulating materials is at the top of the reaction section.

[0042] The operation data shows: the temperature at the top of the tower is 65°C, the t...

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Abstract

The invention relates to the field of chlorosilane system distillation technology. A large amount of chlorosilane waste gas is generated in a polysilicon production process, and a traditional alkali neutralization treatment process generates large material consumption and environmental pollution and constrains the continuous and stable operation of the production. According to the method provided by the invention, the waste gas is introduced into a distillation system and serves as a raw material to obtain trichlorosilane for producing polysilicon, heat recovery and external circulation of a part of materials are carried out in the process, the chlorosilane waste gas is successfully treated, and the method provided by the invention has the beneficial effects of improving the chlorosilane utilization rate, reducing the subsequent waste gas treatment pressure, ensuring low equipment investment and low operation cost, and so on.

Description

technical field [0001] The invention relates to the technical field of chlorosilane system rectification, and more specifically, the invention relates to a method for treating chlorosilane waste gas by using reactive distillation technology. Background technique [0002] At present, most polysilicon enterprises in my country use the improved Siemens method to produce polysilicon, and the intermediate compound trichlorosilane SiHCl 3 (TCS), polycrystalline silicon is deposited in a chemical vapor deposition (CVD) reactor, and in a series of continuous production processes, a large amount of waste gas containing chlorosilane will be produced, which contains SiHCl 3 (TCS); SiH 2 Cl 2 (DCS); SiCl (STC); HCl, etc., so far there is no good treatment method. In the traditional process, alkali neutralization method is used to treat it as waste, which not only increases the difficulty of treatment but also increases the material consumption. At the same time, the emission of chlor...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
CPCY02P20/10
Inventor 张旭宋高杰张小军陈文岳杨振
Owner XINTE ENERGY