Structural design and manufacturing method of multi-section wide-spectrum LED
A technology of LED structure and structure design, applied in chemical instruments and methods, polycrystalline material growth, crystal growth and other directions, can solve the problems of low utilization rate of quantum wells and low hole injection efficiency, etc.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0010] figure 1 A flowchart of an embodiment of the multi-section wide-spectrum LED structure design and manufacturing method provided by the present invention, such as figure 1 As shown, the method includes:
[0011] (1) Pre-introduce metal sources and group V reactants on the substrate, and form a buffer layer on the substrate through pyrolysis;
[0012] When the surface temperature of the substrate material rises to about 530°C, the metal source and ammonia gas (NH3) are introduced to react for 3-5 minutes. At this temperature, the metal source and NH3 decompose and undergo a chemical reaction to form an amorphous buffer growth layer. The metal source reactant and the buffer layer have the following characteristics: ① can be decomposed into metal atoms at high temperature; ② metal atoms can react with N atoms to form an amorphous GaN buffer layer as shown in the figure; ③ buffer layer The thickness may be 0 to 100 nm.
[0013] (2) Increase the growth temperature, grow a...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 