Unlock instant, AI-driven research and patent intelligence for your innovation.

Calculation method of line resistance of ito line

A line and line technology, applied in the field of measurement and calculation of ITO line resistance, can solve problems such as inaccurate measurement results, improper operation methods, and reduced production yield, so as to improve measurement efficiency, reduce overall damage, and improve production yield. Effect

Inactive Publication Date: 2016-06-29
SHANDONG HUAXIN FUCHUANG ELECTRONICS SCI & TECH
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method is time-consuming and cumbersome to operate, especially for large-size touch panels, with a large number of ITO lines, which takes a long time to measure and reduces production efficiency
[0005] On the other hand, due to manual measurement with a multimeter, improper operation methods will cause damage to the ITO line, causing the entire panel to be scrapped, and personnel measurement errors will cause inaccurate measurement results, increasing the number of unqualified products being regarded as qualified products. The possibility of continuing the follow-up process increases the production cost of the follow-up process and reduces the production yield; what's more, due to the failure to detect the unqualified products in time, the unqualified products flow into customers, and the resulting losses are very serious.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Calculation method of line resistance of ito line
  • Calculation method of line resistance of ito line
  • Calculation method of line resistance of ito line

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] Although the inventive concept of the present invention is proposed for the first time, after understanding the basic concept of the present invention, it is relatively easy for those skilled in the art to understand in combination with the common knowledge in this field, so the present invention is based on the appended figure 1 And attached figure 2 The ITO diamond-shaped grid line structure shown in the diamond-shaped grid line structure is described as an example, which is more conducive to the understanding of those skilled in the art.

[0023] As is known, ITO conductive glass is made by coating a layer of indium tin oxide (commonly known as ITO) film by magnetron sputtering on the basis of soda-lime-based or silicon-boron-based substrate glass. Of course, although ITO conductive glass is called conductive glass, its application is not limited to glass substrates, such as the aforementioned PET substrates.

[0024] For example, a layer of indium tin oxide is spu...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method for measuring and calculating the line resistance of an ITO circuit, which comprises the following steps: 1) after sputtering a layer of ITO on a substrate, measuring the square resistance R of the ITO 方 ; 2) Make a unit circuit with a predetermined shape on ITO; 3) Scan the vertical and horizontal lengths of each component of the predetermined shape on the ITO through a metallographic microscope according to the predetermined shape of the unit circuit; 4) According to the conversion book of square resistance and line resistance The resistance of each component of the unit line is directly calculated from the vertical and horizontal lengths; 5) the resistance of each component of the unit line is accumulated to obtain the line resistance of the unit line. According to the invention, the risk of easily damaging the ITO conductive film by using the multimeter can be reduced, and the production yield can be improved.

Description

technical field [0001] The invention relates to a method for measuring and calculating the line resistance of an ITO line, belonging to the field of touch panel technology research, wherein ITO is an indium tin oxide conductive film, which is usually based on a soda-calcium-based or silicon-boron-based substrate glass. A layer of indium tin oxide is plated by magnetron sputtering. Background technique [0002] At present, the structure of the touch panel produced in the touch panel (touch panel, also known as touch screen, touch panel) industry is generally to sputter one or more layers on a glass substrate or PET (Polyethyleneterephthalate, polyethylene terephthalate). ITO with a certain thickness is etched to form an ITO line of a certain shape. When the user touches it, the mutual capacitance of the sensing unit at the intersection of the surface row or column will change. According to the above changes, the touch IC (integrated circuit, integrated circuit) will finally d...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G06F3/041
Inventor 任夫洋黄孝宁刘骥沈效龙
Owner SHANDONG HUAXIN FUCHUANG ELECTRONICS SCI & TECH