Unlock instant, AI-driven research and patent intelligence for your innovation.

Gas ion source gas inlet real-time control system

A real-time control system and ion source technology, applied to electrical components, discharge tubes, circuits, etc., can solve problems such as large production investment, affecting the quality of beam extraction, and inability to accurately reflect stability

Inactive Publication Date: 2014-04-16
WUXI HUIMING ELECTRONICS TECH
View PDF0 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method has the following disadvantages: firstly, using the loop current of the arc power supply as a feedback signal cannot accurately reflect the stability of the ion current density of the ion source, so the obtained arc current ion density may be unevenly distributed, which affects the quality of the beam extraction; secondly , the design of the arc power source applied by this method is more complicated, the production investment is large in the application process, and the maintenance is difficult

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Gas ion source gas inlet real-time control system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0010] Embodiment 1: as figure 1 As shown, a gas ion source is fed through a gas flow meter, and a Langmuir probe plasma measuring instrument penetrates from the outside of the ion source to the inside of the discharge chamber of the ion source. When the ion source is working, the measurement signal of the plasma measuring instrument is transmitted to the console through the optical fiber, and the console judges the amount of air intake according to the measurement signal, and then controls the amount of intake air of the gas flowmeter through the optical fiber.

Embodiment 2

[0011] Embodiment 2: as figure 1 As shown, a gas ion source is fed through two to three gas flowmeters, and a Langmuir probe plasma measuring instrument penetrates deep into the discharge chamber of the ion source from the outside of the ion source. When the ion source is working, the measurement signal of the plasma measuring instrument is transmitted to the console through the optical fiber, and the console judges the amount of air intake according to the measurement signal, and then controls the amount of air intake of each gas flowmeter through the optical fiber.

Embodiment 3

[0012] Embodiment 3: as figure 1 As shown, a gas ion source is fed through a gas flow meter, and a Faraday cup collects the extracted beam behind the ion source extraction hole. When the ion source is working, the signal of the extracted beam is transmitted to the console, and the console judges the size of the intake air according to the measurement signal, and then controls the intake volume of each gas flow meter through the optical fiber.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a structure of a high-pressure ion source gas inlet real-time control system. The system comprises a feedback signal generating and transmitting part, a signal processing and controlling part and a controlling, transmitting and executing part, an ion saturated flow sensor stretches into an ion source, a controllable gas valve is mounted on the side face of the ion source, according to the difference value between ion saturated flow signals measured by the ion saturated flow sensor and set reference signals, the gas inlet quantity of the ion source is adjusted, so that the difference value is reduced, and voltages at the two ends of the controllable gas valve are controlled to enable lead-out flow to be gradually close to the reference value. According to the system, the working mode of the ion source is simple, the reliability and the stability of the ion source system are improved, due to the adjustment of the gas inlet quantity, charging is carried out on plasmas as needed, burdens of vacuum air exhaust by the system are reduced, stable and even plasma density can be obtained, and the system can lead out high-quality beam currents.

Description

technical field [0001] The present invention relates to various gas ion sources and gas plasma devices. Background technique [0002] An ion source is a device that produces a beam of high energy ions. It is the core component of various particle injection accelerators and the key component of the beam source of the neutral beam injector. Whether it is an ion beam implanter or a neutral beam implanter, the ion source should provide a stable and high-quality ion beam to be used in various ion beam extraction situations. [0003] In the plasma arcing discharge process of the ion source, if constant voltage, constant current and stable air intake conditions are used, the arc power supply will be overloaded in a short time, resulting in power overcurrent protection or plasma instability and even rupture. At present, the technology used to control the arcing current of the ion source is mainly: use the transformer to measure the arc current loop current, compare the measured c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/317H01J37/30
Inventor 袁萍
Owner WUXI HUIMING ELECTRONICS TECH