Plasma switch for laser pulse shaping

A plasma and laser pulse technology, applied in the laser field, can solve the problems of low device repetition rate, complex device, low laser transmittance, etc., and achieve the effect of improving the repetition rate, high peak power, and high laser transmittance

Active Publication Date: 2017-03-01
HUAZHONG UNIV OF SCI & TECH
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0008] In short, although the existing plasma switches can shorten the laser pulse width to a certain extent, there will be problems such as low laser transmittance, complicated devices, or low repetition rates of devices.

Method used

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  • Plasma switch for laser pulse shaping

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Embodiment Construction

[0017] The specific embodiments of the present invention will be further described below in conjunction with the accompanying drawings. It should be noted here that the descriptions of these embodiments are used to help understand the present invention, but are not intended to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below may be combined with each other as long as they do not constitute a conflict with each other.

[0018] Such as figure 1 As shown, a plasma switch for laser pulse shaping provided by an example of the present invention includes a vacuum chamber 2 , a first lens 3 , a second lens 4 , a fan 5 and a heat exchanger 6 .

[0019] The first lens 3 and the second lens 4 are two identical ZnSe lenses.

[0020] The vacuum chamber 2 is provided with two facing observation windows for input and output of laser light. An optical platform is provided in the vacuum chamber 2 fo...

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Abstract

The invention discloses a plasma switch for laser pulse shaping. The background gas of the plasma switch is mixed with easily ionized gas, and the plasma switch enables the gas to flow continuously and is provided with a cooling device. The easily ionized gas is triethylamine. The switch concretely comprises a vacuum chamber, a first lens, a second lens, a fan and a heat exchanger, wherein the first lens, the second lens, the fan and the heat exchanger are located in the vacuum chamber; the first and second lenses are the same ZnSe lenses; the vacuum chamber is formed with two inspection windows which are opposite to each other and are used for inputting and outputting laser; the centers of the two inspection windows of the vacuum chamber and the centers of the first and second lenses are located on the same straight line; the distance between the two lenses is 2f, wherein f is the focus of the lens. Compared with the prior plasma switch, the plasma switch for laser pulse shaping has advantages that the pulse width is lowered based on guaranteeing the relative high laser transmittance, and accordingly the output pulse has relative high peak power, and the repetitive rate of the device is improved.

Description

technical field [0001] The invention belongs to the field of laser technology, specifically a plasma switch for laser pulse shaping, mainly used for pulsed CO 2 The laser pulse of the laser is shaped to remove the tail of the pulse and shorten its pulse width. Background technique [0002] Transverse Excitation Atmosphere (TEA) CO 2 Lasers are widely used in lidar, laser ranging, infrared countermeasures, biomedicine, environmental detection, and high-density airborne optical communications. In addition, high repetition rate pulsed CO 2 The laser can also interact with the target material to generate plasma, which emits extreme ultraviolet (EUV) light. The laser plasma (LPP) EUV light source is a very competitive extreme ultraviolet lithography light source for the next generation. Pulsed CO 2 These applications of lasers require high laser peak power, but the front edge of the output waveform of pulsed laser is very steep, the pulse period is 50-100ns, but the trailing e...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/01H01S3/10
Inventor 刘璐宁王新兵卢宏左都罗陆培祥
Owner HUAZHONG UNIV OF SCI & TECH
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