A photoresist recovery system

A recovery system and photoresist technology, which is applied to the surface coating liquid device, coating, etc., can solve the problems of coating photoresist waste and reduce production costs, and achieve the goal of reducing waste and production costs Effect
CN103769351BInactive Publication Date: 2016-08-17BEIJING BOE DISPLAY TECH CO LTD +1
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Patent Information

Authority / Receiving Office
CN ยท China
Patent Type
Patents(China)
Current Assignee / Owner
BEIJING BOE DISPLAY TECH CO LTD
Publication Date
2016-08-17
Estimated Expiration
Not applicable ยท inactive patent

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Abstract

The invention discloses a photoresist recovering system which is used for solving the problems that the used photoresist exhausted from a photoresist coating machine is wasted. The system comprises a receiving device which is connected with the photoresist coating device, and a conveying device connected with a first buffer device and a second buffer device, respectively, and is used for conveying the photoresist in the first buffer device into the second buffer device, wherein the top of the second buffer device is connected with a dry and clean air source via a pipeline which is provided with a second control valve; the bottom of the second buffer device is connected with a pipeline which is provided with a fourth control valve; the second buffer device is used for containing the used photoresist conveyed by the conveying device and conveying the used photoresist to a photoresist barrel via the pipeline provided with the fourth control valve under the air pressure provided by the dry and clean air source. The used photoresist exhausted from the photoresist coating machine enters the photoresist barrel via the devices, in this way, the photoresist can be recycled, and consequently, the production cost is reduced.
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Description

technical field

[0001] The invention relates to the technical field of display devices, in particular to a photoresist recovery system. Background technique

[0002] In the photolithography process of making color filter substrates and array substrates, the photoresist is mainly diluted to a certain concentration by adding a diluent to the photoresist, and then spin coating (Spin coat) or slit coating Slit coat method, the diluted photoresist is evenly coated on the substrate. In order to coat the photoresist evenly on the substrate, the spin coating method usually first coats a large amount of photoresist on the substrate, and then rotates the substrate so that the photoresist can be evenly coated on the entire substrate. In this coating method, the utilization rate of photoresist is low, and most of the photoresist is discharged into the waste liquid tank during the spin coating process; while in the slit coating method, the working table is The upper coated substrate is...

Claims

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