plasma source

Abstract

The invention provides a plasma source which can prolong an exchange cycle of an adhering prevention plate and improve running rate of the plasma source. The plasma source (1) comprises a plasma generating container (2), the adhering prevention plate (5), a plurality of permanent magnets (3), and a magnet (4). The plasma generating container (2) comprises a cooling mechanism which generates gas used for plasma to guide the gas into the container. The adhering prevention plate (5) is configured on the inner side of the plasma generating container (2). The plurality of permanent magnets (3) are configured on the outer sides of the plasma generating container (2), used to generate cusped magnetic field. The magnet (4) is disposed on the inner side of the plasma generating container (2), and on the position opposite to the permanent magnets (3) and separated with the wall of the plasma generating container (2), the magnet (4) is configured on the inner wall of the plasma generating container (2) in a manner of abutting with the inner wall of the plasma generating container (2).

Description

Technical field [0001] The present invention relates to a plasma source provided with a permanent magnet for blocking plasma, and more particularly to a plasma source provided with an anti-landing plate inside the plasma source. Background technique [0002] Plasma sources are widely used in ion beam irradiation devices, electron beam irradiation devices, plasma doping devices, submerged plasma guns, etc. [0003] For example, in an ion beam irradiation apparatus that irradiates a semiconductor wafer with a positively charged ion beam, an electrode called an extraction electrode is arranged downstream of the plasma source and has a potential more negative than that of the plasma source. This leads to the ion beam. The number of the electrodes is not limited to one. In order to extract the ion beam, there are sometimes multiple electrodes. In this case, these electrodes are called extraction electrode systems. In the ion beam irradiation device, the electrode group or one electro...

AI Technical Summary

Problems solved by technology

However, if the anti-slip plate is not thick enough, although the collision between the electrons and the anti-slip plate can be avoided, because the anti-slip plate is thin, there is a corresponding problem that it must be replaced immediately if it is slightly damaged.

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