TAVCN hard nanostructure film and preparation method
A nanostructure and thin film technology, applied in ion implantation plating, metal material coating process, coating and other directions, can solve problems such as unsatisfactory friction and wear performance
Inactive Publication Date: 2016-06-08
JIANGSU UNIV OF SCI & TECH
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Problems solved by technology
The invention overcomes the disadvantages of unsatisfactory friction and wear performance of the existing TaCN hard nanostructure composite film, has high production efficiency, has both high hardness and excellent friction and wear performance, and can be used as a nanostructure hard film for high-speed, dry cutting
Method used
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Experimental program
Comparison scheme
Effect test
Embodiment 1
[0020] Experimental parameters: Ta target power 100W, C target power 60W, V target power 0W, V content 0at.%, hardness 26GPa. Under the dry cutting test, the average friction coefficient at room temperature is 0.41, and the friction coefficient at 700°C is 0.65.
Embodiment 2
[0022] Experimental parameters: Ta target power 100W, C target power 60W, V target power 40W, V content 17.7at.%, hardness 29.7GPa. Under the dry cutting test, the average friction coefficient at room temperature is 0.27.
Embodiment 3
[0024] Experimental parameters: Ta target power 100W, C target power 60W, V target power 60W, V content 26.85at.%, hardness 32GPa. Under the dry cutting test, the average friction coefficient at room temperature is 0.26.
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Abstract
The invention discloses a TaVCN hard nanometer structure thin film and a preparation method thereof. The TaVCN hard nanometer structure thin film is characterized in that the thin film is obtained by using a multi-target confocal radio frequency reaction sputtering method for deposition on hard alloy or a ceramic substrate, the molecular formula of the thin film is (Ta, V)CN, the thickness of the thin film is 1-3 micrometers, and the content of V is 0-40at.%. During deposition, the vacuum degree is superior to 3.0*10<-3>Pa, argon is used as starting arc, nitrogen is used as reaction gas for deposition, the sputtering pressure is 0.3Pa, the flow ratio of argon to nitrogen is 10: (2-5), the power of a Ta target is 80-150W, the power of a C target is 40-60W, the power of a V target is 0-100W. The obtained hard coating has the excellent characteristics of high hardness and high wear resistance.
Description
technical field [0001] The invention relates to a coating and a preparation method thereof, in particular to a TaVCN hard nanostructure film and a preparation method thereof, belonging to the technical field of ceramic coatings. Background technique [0002] With the development of modern processing technology, especially the emergence of high-speed, dry cutting and other processing methods, in addition to requiring the coating to have the high hardness and excellent high-temperature oxidation resistance that ordinary cutting tool coatings should have, it is also required that the coating has Excellent friction and wear properties. However, although the existing tool coatings have high hardness, their friction and wear properties are not ideal and cannot meet the requirements. Tantalum nitride (TaN) thin films have excellent properties such as high melting point, high hardness, and good biocompatibility, and can be widely used in integrated circuit components and medical fi...
Claims
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IPC IPC(8): C23C14/06C23C14/34
Inventor 喻利花许俊华黄婷
Owner JIANGSU UNIV OF SCI & TECH