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Plate electrode for plasma cleaning, electrode assembly and device

A technology of plasma cleaning and electrode plates, applied in the direction of cleaning methods and appliances, chemical instruments and methods, etc., to achieve the effects of good cleaning effect, high conductivity, strong hardness and mechanical properties

Inactive Publication Date: 2014-07-23
SHENNAN CIRCUITS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] During the research and practice of the prior art, the inventors of the present invention have found that the existing tubular electrodes for plasma cleaning still have a lot of room for improvement

Method used

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  • Plate electrode for plasma cleaning, electrode assembly and device
  • Plate electrode for plasma cleaning, electrode assembly and device
  • Plate electrode for plasma cleaning, electrode assembly and device

Examples

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Embodiment Construction

[0017] An embodiment of the present invention provides an electrode plate for plasma cleaning, which can further improve the performance of the electrode and enhance the effect of plasma cleaning. Embodiments of the present invention also provide corresponding sum electrode devices and equipment. A detailed description will be given below in conjunction with the accompanying drawings.

[0018] Please refer to figure 1 and figure 2 , an embodiment of the present invention provides an electrode plate for plasma cleaning.

[0019] The electrode plate 100 is made of aluminum or aluminum alloy and has a grid-like structure. The interior is hollow to form a cavity 110. The cavity 110 has two openings 170 for liquid injection and outflow respectively.

[0020] In one embodiment, the grid-like structure may be formed by opening several regularly arranged rectangular hollow grooves 130 on a rectangular sheet-shaped body 120 .

[0021] In another embodiment, the electrode plate may...

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PUM

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Abstract

The invention discloses a plate electrode for plasma cleaning. The plate electrode for plasma cleaning is made of aluminum or aluminum alloy and is of a grid structure, the plate electrode is hollow to enable an inner cavity to be formed inside the plate electrode, the inner cavity is provided with two openings, and the two openings are used for allowing liquid to be injected into the inner cavity and allowing the liquid to flow out of the inner cavity respectively. According to the plate electrode for plasma cleaning, due to the fact that the plate electrode is made of aluminum or aluminum alloy, the electrical conductivity is high, the hardness is high, and the mechanical property is good; due to the fact that the plate electrode is in the grid shape, gas can be electrolyzed more thoroughly, the whole cavity is filled with plasma generated after the gas is electrolyzed, and the cleaning effect is better; due to the fact that the plate electrode is hollow to enable the inner cavity to be formed inside the plate electrode and the inner cavity is provided with the two openings used for allowing the liquid to be injected into the inner cavity and allowing the liquid to flow out of the inner cavity respectively, clod water can be allowed to flow through the inner cavity in a circulating mode so as to cool the plate electrode, and the service life of the plate electrode is prolonged. The embodiment of the invention further provides a corresponding electrode assembly and a device.

Description

technical field [0001] The invention relates to the technical field of plasma cleaning equipment, in particular to an electrode plate, electrode device and equipment for plasma cleaning. Background technique [0002] In the prior art, the residues in various small holes, blind holes, and dense holes drilled on the circuit board, such as smear, are usually removed by a wet process, for example, using potassium permanganate The smear removal process is used for processing, but because of the liquid tension, the processing effect cannot meet the demand. [0003] At present, plasma has begun to be applied in fields such as cleaning and desmearing. Plasma can be generated in the process of ultraviolet emission of fluorescence, which is the state of matter after gas ionization, and its active components include ions, electrons, free radicals or active groups. [0004] An existing plasma cleaning method is as follows: inject reactive gas into a vacuum environment, and form plasma...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B7/00
CPCB08B7/00
Inventor 黄金元雍蓉王建坤李超
Owner SHENNAN CIRCUITS
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