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Polysilicon preparation apparatus

A technology of polysilicon and dichlorodihydrogen silicon, applied in the fields of silicon compounds, sustainable manufacturing/processing, inorganic chemistry, etc., can solve the problems of increasing control and operation difficulty, etc.

Inactive Publication Date: 2014-07-30
CHINA ENFI ENGINEERING CORPORATION
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The advantage of this method is that only one rectification tower is needed, which saves equipment and energy consumption. Purity requirements, the temperature of each part in the tower needs to be strictly controlled, which greatly increases the difficulty of control and operation

Method used

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Embodiment Construction

[0018] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0019] Refer below figure 1 The device for preparing polysilicon according to the embodiment of the present invention will be described. The device 100 for preparing polysilicon according to the embodiment of the present invention includes a rectification tower 10 , an evaporator 20 and a reduction furnace 20 .

[0020] Wherein, the rectifying tower 10 has a tower top extraction outlet 11, a tower bottom extraction outlet 12 and a feed inlet 13; the tower top extraction outlet 11 is suitable for discharging a mixed solution conta...

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Abstract

The invention provides a polysilicon preparation apparatus. The apparatus comprises a rectifying tower, an evaporator and a reducing furnace, and the rectifying tower has a tower top collection outlet used for discharging a mixed liquid containing dichiorosilane and trichlorosilane, a tower bottom collection outlet used for discharging a silicon tetrachloride, and a feed inlet used for adding chlorosilane; the evaporator has a liquid inlet, a hydrogen inlet and a raw gas outlet, the liquid inlet is connected with the tower top collection outlet of the rectifying tower, and the evaporator is used for evaporating the mixed liquid in order to obtain a raw gas containing dichiorosilane, trichlorosilane and hydrogen; and the reducing furnace is connected with the raw gas outlet of the evaporator in order to prepare polysilicon by utilizing the raw gas. Chlorosilane can be separated and purified only by using one rectifying tower through the polysilicon preparation apparatus provided by the embodiment of the invention, and a tower top collection liquid obtained through separation can be directly used for preparing polysilicon, so the apparatus configuration is substantially saved, and energy consumption is reduced.

Description

technical field [0001] The invention relates to the field of polysilicon, in particular, the invention relates to a device for preparing polysilicon. Background technique [0002] Polysilicon is an ultra-high-purity material used in integrated circuits, electronic devices and solar cells. It is the cornerstone of the information and new energy industries. It is a strategic material that the country encourages and gives priority to development. It is also a product and industry that the country encourages the development of. [0003] At present, the main production method of polysilicon in China is the improved Siemens method, which mainly includes five processes of trichlorosilane synthesis, rectification purification, reduction, dry recovery of reduction tail gas and hydrogenation. The chlorosilanes obtained in the dry reduction tail gas recovery process and the thermal hydrogenation process mainly include dichlorodihydrosilane, trichlorosilane and silicon tetrachloride, wh...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/035
CPCY02P20/10
Inventor 姜利霞严大洲杨永亮肖荣晖汤传斌
Owner CHINA ENFI ENGINEERING CORPORATION
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