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Device for measuring fractional-order optical vortex topology charge values and measuring method thereof

A technology of topological charge and order optics, which is applied in the field of devices for measuring the topological charge value of fractional optical vortex

Inactive Publication Date: 2014-07-30
HENAN UNIV OF SCI & TECH
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Problems solved by technology

But these two methods are realized by measuring the number of interference / diffraction fringes, which can only achieve half-integer order (0.5 order) precision (A. Mourka et al., Optics Express 19 (2011) 5760) topological charge value measurement

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  • Device for measuring fractional-order optical vortex topology charge values and measuring method thereof

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Embodiment Construction

[0050] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0051] according to figure 1 Structural layout of the measurement optical path diagram; As can be seen from the accompanying drawings, a device for measuring the topological charge value of the fractional optical vortex includes a continuous wave laser 100, and a collimated beam expander is arranged in sequence in the direction of the beam advance of the continuous wave laser 100 Device 110, Gaussian-top hat beam converter 120, polarizer 131, beam splitter 140; after beam splitter 140, the laser beam is divided into transmitted light and reflected light, and the transmitted light and reflected light form an angle of 90° , the transmitted light is irradiated on the spatial light modulator 150 as a reference beam; the reflected beam is irradiated on the mirror 220, and the mirror 220 is installed on the piezoelectric cera...

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Abstract

Provided are a device for measuring fractional-order optical vortex topology charge values and a measuring method thereof. The measuring method comprises the steps of writing generated calculating holographic images into a spatial light modulator through a computer holographic technique, acquiring wrapped phase images of vortex light beams through Michelson interference light paths and a four-step phase shifting technique, analyzing distribution of real phases theta of the vortex light beams through a phase image unwrapping algorithm, and calculating according to the topology charge definition of m=theta / 2pi to obtain topology charge values m of any fractional-order accuracy. The device and method achieve the measurement of any step (0.1 step) of topology charge values of the fractional-order vortex light beams, can correct measurement of topology charge values of vortex light beams from existing half-integer step (0.5 step) to any step and can be widely applied to measurement of topology charge values in the fields of bose-einstein condensation, quantum communication, information coding and transmission, particle confinement, optical tweezers, optical wrenches and the like.

Description

technical field [0001] The invention relates to a device and method for measuring the topological charge value of fractional-order optical vortex, in particular to a device and method for measuring the topological charge value of fractional-order vortex by using phase. Background technique [0002] As the vortex beam has important application prospects in the fields of Bose-Einstein condensate, quantum information coding, particle trapping, optical tweezers and optical wrench, it has become a very important research hotspot in the field of information optics in recent years. In 2004, M.V. Berry systematically and comprehensively expounded the theoretical basis of fractional optical vortex for the first time (M. V. Berry, J Opt a-Pure Appl Op 6 (2004) 259). Fractional vortex beams can carry more information and provide finer particle manipulation, which has become a hot topic for many researchers in the field of vortex optics. [0003] The most elegant way to generate fracti...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01J9/00
Inventor 李新忠台玉萍王辉张利平李海生吕芳捷李立本
Owner HENAN UNIV OF SCI & TECH
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