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A method of manufacturing a diffractive optical element

A technology of diffractive optical element and manufacturing method, applied in the field of manufacturing micro-optical devices, can solve problems such as restricting the size of micro-lenses, and achieve the effects of avoiding errors, reducing process steps, and reducing difficulty

Active Publication Date: 2016-08-17
XIAMEN UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, the current general photolithography accuracy seriously restricts the continued reduction of the size of the microlens.

Method used

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  • A method of manufacturing a diffractive optical element
  • A method of manufacturing a diffractive optical element
  • A method of manufacturing a diffractive optical element

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Experimental program
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Embodiment Construction

[0024] The process flow of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0025] 1. If figure 1 As shown, a layer of metal layer 12 is measured and controlled to be sputtered on the cleaned substrate 11, then photoresist 13 is spin-coated, placed in a vacuum oven and baked for a certain period of time to harden the film, and then photolithography 15 is performed. exist figure 1 Among them, mark 14 is the mask plate.

[0026] 2. After photolithography, develop and corrode. In order to accurately transfer the pattern of the mask plate to the metal layer 12, it is necessary to quantitatively and accurately control the corrosion time and the concentration of the corrosion solution, and then remove the glue (such as figure 2 shown).

[0027] 3. If image 3 As shown, the inductively coupled plasma (ICP) etching 31 etches the substrate, and the etching depth is the total etching thickness d / the number of steps n.

[0028...

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Abstract

The invention provides a manufacturing method of a diffraction optimal element, and relates to manufacturing of micro optical elements. The method comprises the steps that (1) a metal layer is manufactured on a substrate; (2) gluing, photoetching and developing are performed, the metal layer is corroded to serve as an etching mask, and the diameter of the metal layer serves as the external diameter of a ring belt on the outermost layer of a micro lens; (3) a first ring belt on the outermost layer is formed by etching the substrate according to the designed thickness; (4) gluing is performed for the second time, exposing, photoetching and developing are performed on the back surface, photoresist is kept, side-etching is performed on the metal layer in the step (2), and the photoresist is removed; (5) gluing is performed on the front surface, and exposing and developing are performed on the back surface; (6) a second ring belt on the outermost layer is formed by etching the substrate according to the designed thickness; (7) executing the step (4) until all ring belts are etched, and the micro lens diffraction optimal element with multiple steps is obtained. The manufacturing method reduces unavoidable errors caused by a traditional etching method for manufacturing the micro lens, the number of technology steps in a manufacturing process is reduced, difficulty is lowered, and meanwhile approaches are provided for manufacturing other devices with multiple steps.

Description

technical field [0001] The invention relates to the manufacture of micro-optical devices, in particular to a method for manufacturing a diffractive optical element for making multi-step micro-lenses without overlaying and plate alignment. Background technique [0002] The manufacture of diffractive microlens arrays is developed based on the traditional refractive microlens arrays, and the manufacturing processes of the two are inherited. Diffractive microlenses have multi-step characteristics. At present, their manufacturing methods are roughly divided into photoresist plus ion etching transfer method, beam energy direct writing technology and grayscale mask technology. However, the most practical and reliable method is the method of photoresist plus ion etching transfer. [0003] For binary microlenses, the phase approximation expression of the step-shaped distribution can subtly overcome the difficulties encountered in processing a shape with a continuously changing thick...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G02B3/00G03F7/20
Inventor 张保平左海杰张江勇应磊莹
Owner XIAMEN UNIV