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Hydrogen passivation of nonlinear optical crystals

A nonlinear optics and crystal technology, applied in nonlinear optics, optics, test crystals, etc., can solve problems such as short life, LID resistance drop, etc.

Active Publication Date: 2014-08-06
KLA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, the laser-induced damage rate is also affected by material defects (such as dislocations, impurities, vacancies, etc.) present in the NLO element
In most cases, material defects in a given NLO element lead to reduced resistance of the NLO element to LID
Therefore, NLO elements have a short lifetime due to material defects

Method used

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  • Hydrogen passivation of nonlinear optical crystals
  • Hydrogen passivation of nonlinear optical crystals
  • Hydrogen passivation of nonlinear optical crystals

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Embodiment Construction

[0028] Reference will now be made in detail to the disclosed subject matter which is illustrated in the accompanying drawings.

[0029] general reference Figures 1A to 5 , systems and methods for passivating nonlinear optical (NLO) crystals are described in accordance with the present invention. Laser systems typically use NLO crystals for many applications such as frequency mixing, Raman amplification, Kerr lens mode locking, electro-optic and acousto-optic modulation, and other applications. Exposure to electromagnetic radiation within the laser system affects the physical properties (eg, transmittance, reflectivity, refractive index, etc.) of the NLO crystal. The resulting changes to the physical properties of the NLO crystal are commonly referred to as laser-induced damage (LID) and tend to impair the normal function of the NLO crystal. NLO crystals are less resistant to LID when they have a greater number or amount of crystal defects (eg, dislocations, impurities, vaca...

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Abstract

The present invention includes an expcssure chamber configured to contain a passivating gas having a selected hydrogen concentration, the exposure chamber further configured to contain at least one NLO crystal for exposure to the passivating gas within the chamber, a passivating gas source fluldicaUy connected to the exposure chamber, the passivating gas source configured to supply passivating gas to an interior portion of the exposure chamber, and a substrate configured to hold the NLO crystal within the chamber, the substrate further configured to maintain a temperature of the NLO crystal at or near a selected temperature, the selected temperature being below a melting temperature of the NLO crystal.

Description

[0001] Related Application Cross Reference [0002] This application relates to and claims the benefit of the earliest available effective filing date (e.g., claiming the earliest available priority date other than a provisional patent application or claiming under 35 USC § 119(e) provisional patent application, any or all parent applications, grandparent applications, great-grandparent applications, etc. of related applications). [0003] Related applications: [0004] For the purposes of USPTO extrajudicial requirements, this application constitutes an application filed on October 7, 2011, the inventors being Yung-Ho Chuang and Vladimir Dribinski, titled Formal (non-provisional) patent application of US Provisional Patent Application No. 61 / 544,425 for "NLO CRYSTAL PROPERTIES BY HYDROGENPASSIVATION." technical field [0005] The present invention relates to the field of nonlinear optical materials, and in particular, to a system and method for passivating nonlinear optica...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/35
CPCG01N21/59G01N2021/8477C30B33/00G01N2021/3595C30B33/02C30B29/10G01N2021/8822G01N2021/3568G01N21/9501G01N21/3563C30B33/12G01N21/55G02F1/3551H01S3/109G02F1/3501G01N2021/9511H01L21/3003G01N2201/06113H01S3/094H01S3/027H01L21/322H01S3/1666G01N21/8806G01N21/84G02F1/353
Inventor 勇-霍·庄弗拉基米尔·德里宾斯基
Owner KLA CORP