Dynamic/static hybrid coating system and dynamic/static hybrid coating method by utilization of dynamic/static hybrid coating system

Abstract

The invention relates to a coating system and a coating method, especially to a dynamic / static hybrid coating system and a dynamic / static hybrid coating method by the utilization of the dynamic / static hybrid coating system. The dynamic / static hybrid coating system comprises a static coating system and a dynamic coating system. The static coating system contains a static coating chamber, a first coating assembly and a first transmission assembly. The reciprocating scan distance is zero or any distance less than the spacing between adjacent target materials. The dynamic coating system contains a dynamic coating chamber, a second coating assembly and a second transmission assembly. The dynamic / static hybrid coating method contains two modes. The first mode is as follows: static coating comes first and dynamic coating follows; then vertical transition of a substrate is conducted and the substrate comes out in a reverse direction; and the substrate is uncoated after translation. The second mode is as follows: the substrate firstly enters the innermost chamber; static coating is conducted after vertical transition; then, the substrate comes out in a reverse direction for dynamic coating; and finally, the substrate comes out from a low vacuum chamber. By the system and the method, a substrate can be coated and coating is uniform. Electrostatic damage to an electrostatic sensitive device can be prevented.

Description

technical field [0001] The invention relates to a coating system and a coating method, in particular to a dynamic and static hybrid coating system and a method for performing dynamic and static hybrid coating using the same. Background technique [0002] The plasma generated by the vacuum magnetron sputtering coating process usually causes electrostatic damage to electrostatic sensitive devices, especially when some devices are covered by plasma and other parts are not covered by plasma, which will cause voltage differences between different parts of the device, As a result, the device is broken down by discharge, causing electrostatic damage. [0003] Vacuum coating generally has two methods: Static coating: the glass substrate remains in a static state, a group of targets are evenly distributed in front of the glass substrate, and the target coverage area is slightly larger than the glass substrate. In order to improve the coating uniformity, the magnetic bar of the target...

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Problems solved by technology

[0002] The plasma generated by the vacuum magnetron sputtering coating process usually causes electrostatic damage to electrostatic sensitive devices, especially when some devices are covered by plasma and other parts are not covered by plasma, which will cause voltage differences between different parts of the device, Thus, the device is broken down by discharge, causing electrostatic damage

[0003] Vacuum coating generally has two methods: Static coating: the glass substrate remains in a static state, a group of targets are evenly distributed in front of the glass substrate, and the target coverage area is slightly larger than the glass substrate. In order to improve the coating uniformity, the magnetic bar of the target during coating The direction of the magnetic field scans back and forth. With the current market technology, the film uniformity of the static coating system can only reach about 10% at best; (2) Dynamic coating: the glass substrate passes in front of the target at a constant speed. According to the requirements of coating thickness, A certain number of targets can be equipped, and dynamic coating has the advantage of good uniformity (<5%). However, dynamic coating usually causes electrostatic damage to glass substrates with electronic devices that are sensitive to static electricity. Therefore, currently Glass substrates generally use static coating, not dynamic coating

[0004] At present, the coating uniformity requirement of large display screens is <5%. Static coating is generally difficult to meet the requirements. Due to the problem of electrostatic damage, dynamic coating cannot be used for coating glass substrates of electrostatically sensitive devices.

[0005] CN103255386A (2013-8-21) discloses a dynamic deposition magnetron sputtering coating device method and a substrate manufactured by the method, but the method or device cannot solve the problem of electrostatic damage to electrostatic sensitive devices

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