A substrate drying device and substrate drying method

A drying device and substrate technology, applied in the direction of drying gas arrangement, progressive dryer, drying solid materials, etc., can solve problems such as shedding, lower product yield, substrate defects, etc.

Inactive Publication Date: 2016-04-13
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Using the air knife to dry the substrate, on the one hand, can achieve the drying of the substrate, but on the other hand, the high-pressure air ejected by the air knife is easy to cause the photoresist on the surface of the glass substrate to fall off or partially missing, resulting in There are defects that reduce product yield

Method used

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  • A substrate drying device and substrate drying method
  • A substrate drying device and substrate drying method

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Embodiment 1

[0032] Embodiment 1 of the present invention provides a substrate 4 drying device, the structure diagram is as follows figure 1 As shown, it includes a cavity 7 and a drying rod and an inductor 1 arranged on the top of the cavity 7 , the cavity 7 is filled with a liquid for immersing the substrate 4 .

[0033] The drying bar dries the substrate 4 leaving the liquid, including a first drying bar 21 and a second drying bar 22 arranged in parallel, with a gap between the first drying bar 21 and the second drying bar 22, and one or both ends of the gap are arranged There is a sensor 1 for monitoring the position of the substrate 4 away from the liquid.

[0034] The substrate drying device improves the structure of the existing substrate drying device, no longer uses the air knife to directly dry the substrate surface, and monitors the position where the substrate leaves the liquid through the sensor. The gas ejected from the drying rod on the side dries the substrate to avoid def...

Embodiment 2

[0046] Based on the above, Embodiment 2 of the present invention also provides a method for drying a substrate based on the substrate drying device described in Embodiment 1, which specifically includes:

[0047] The substrate gradually leaves the liquid under the thrust force. When the sensor senses that the substrate leaves the liquid, the first drying rod and the second drying rod located on both sides of the substrate spray gas to the surface of the substrate. At the same time, the substrate continues to leave the liquid under the thrust. Under the action of gas, the Marangoni effect is used to change the surface tension of the liquid film on the substrate, and the surface tension gradient of the liquid film shrinks the liquid film to realize the drying of the substrate surface.

[0048] Further, when the sensor senses that the substrate is completely separated from the liquid, the ejection of gas is stopped.

[0049] Based on the above, the schematic diagram of the drying...

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Abstract

The invention discloses a substrate drying device and a substrate drying method, wherein the substrate drying device includes a cavity, a drying rod and an inductor arranged on the top of the cavity, the cavity is filled with liquid for submerging the substrate; The substrate is dried, including first drying rods and second drying rods arranged in parallel, there is a gap between the first drying rod and the second drying rod, and sensors are arranged at one or both ends of the gap, which are used to control the substrate from the liquid. The location is monitored. By using the above-mentioned device, the gas is sprayed to the surface of the substrate away from the liquid through the drying rod, and the surface tension gradient formed by changing the surface tension of the liquid film by the Marangoni effect is used to shrink the liquid film and dry the surface of the substrate without causing damage to the surface of the substrate. defects and improve substrate yield.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a substrate drying device and a substrate drying method. Background technique [0002] At present, in the manufacturing process of substrates in the field of liquid crystal display device processing, circuit patterns or color filters (CF for short) are generally formed on glass substrates to obtain array substrates and color filter substrates. The liquid crystal is dripped on the film substrate, and then the two are combined to obtain a display panel. Generally, before making circuit patterns and color filters on the glass substrate, it is necessary to perform chemical treatment such as developing or etching on the glass substrate. [0003] Before or after the substrate is treated with the chemical solution, the substrate must be cleaned with a cleaning solution such as pure water. In order to carry out the subsequent process normally, the cleaned substrate also n...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F26B5/00F26B21/14
CPCF26B5/14F26B21/004F26B21/14F26B5/00F26B15/20
Inventor 张小祥郭总杰刘正王守坤刘明悬
Owner BOE TECH GRP CO LTD
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