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A Measuring Method of Light Intensity Distribution on Pupil Surface

A technology of light intensity distribution and measurement method, which is applied in the field of measurement of light intensity distribution on the pupil surface, and can solve problems such as the influence of processing results, the increase of measurement time, and the correction of original images.

Active Publication Date: 2016-03-30
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the accuracy requirement is very high, it may be necessary to measure dozens or even hundreds of images, which increases the measurement time and also puts forward higher requirements for the stability of the lighting system. In fact, the pupil measured in this way is Average value of the illuminated pupil over the measurement time
[0005] In Chinese patent 200910046820.3, the collected original image is not corrected, which will affect the final processing result

Method used

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  • A Measuring Method of Light Intensity Distribution on Pupil Surface
  • A Measuring Method of Light Intensity Distribution on Pupil Surface
  • A Measuring Method of Light Intensity Distribution on Pupil Surface

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Embodiment Construction

[0022] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0023] figure 1 It is a schematic structural diagram of the pupil surface light intensity distribution measuring device of the present invention. like figure 1 As shown, the measuring device includes: a mask 1 , a small hole mark 2 , a lens 3 , a focal plane 4 , and an area array sensor 5 . The illuminating light source passes through the small hole mark 2 on the mask 1 and then passes through the lens 3 , and irradiates onto the surface of the area sensor 5 after defocusing. In this way, the sensor exposure image reflecting the light intensity distribution on the illumination pupil surface is obtained. In this measurement system, the uneven transmittance of the mask, the sensitivity difference of each pixel of the area array sensor, and the difference between the area array sensor as a planar device and the cosine radiation will cause erro...

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Abstract

The invention discloses a method for measuring light distribution on an illumination pupil plane. The method comprises the steps of obtaining multiple images reflecting the pupil morphology with an area array sensor, obtaining a relatively accurate pupil plane light distribution image by establishing a reasonable sensor model and iterative computation, and finally calculating pupil parameters. By the adoption of the measuring method, quite high measurement accuracy can be realized within a short period of measurement time.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a method for measuring light intensity distribution on a pupil surface of a lithography device. Background technique [0002] In the lighting and projection system of a lithography device, the light intensity distribution on the pupil surface has a great influence on the resolution, line width, and depth of focus. The shape of the pupil in the lithography machine is mainly determined by the diffraction element DOE. Due to the error of DOE and the installation and adjustment error of the lighting system, there is generally a certain deviation between the actual pupil shape and the ideal pupil shape. Therefore, the light intensity distribution of the pupil surface is generally obtained through the pupil test, so as to reversely obtain the installation deviation of the DOE and the lighting system, and then adjust to make the machine achieve the best imaging...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G01J1/42
Inventor 葛亮马明英
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD