Continuous gas-liquid separation device used for immersion type photoetching machine under negative-pressure environment

Abstract

The invention discloses a continuous gas-liquid separation device used for an immersion type photoetching machine under a negative-pressure environment. The continuous gas-liquid separation device comprises a gas-liquid separation and storage containing cavity containing a liquid level detection element, a vacuum loop and a water discharging loop, wherein a gas-liquid mixture in the vacuum loop is connected with an inlet in the upper part of the gas-liquid separation and storage containing cavity; the inlet of a vacuum pressure transmitter is connected with an outlet in the upper part of the gas-liquid separation and storage containing cavity; the outlet of the vacuum pressure transmitter is connected with a gas recycling point through a vacuum proportional valve, a switching valve, a vacuum pump and a gas-liquid separator sequentially; the vacuum pressure transmitter and the vacuum proportional valve are electrically connected with a controller; the outlet in the bottom of the gas-liquid separation and storage containing cavity in the water discharging loop is divided into two paths, one path is connected with the inlet of a self suction pump through a flow adjusting valve and the other path is connected with the inlet of an unloading valve; the outlet of the self suction pump and the outlet of the unloading valve are connected with a liquid outlet point. According to the continuous gas-liquid separation device, the separation of a gas phase and a liquid phase can be continuously carried out; the separation of the gas phase and the liquid phase under the negative-pressure environment can be realized.

Description

technical field [0001] The invention relates to a continuous gas-liquid separation device, in particular to a continuous gas-liquid separation device used in a negative pressure environment in an immersion photolithography machine. technical background [0002] Immersion lithography (Immersion Lithography) equipment fills a liquid with a high refractive index between the last projection objective lens and the silicon wafer, which improves the numerical aperture of the projection objective lens ( NA), thereby improving the resolution and depth of focus of the lithography equipment. Among the proposed next-generation lithography machines, immersion lithography requires the least modification to existing equipment and has a good inheritance to the current dry lithography machines. The solution commonly used at present is the local immersion method, that is, the liquid is limited to the local area between the upper surface of the silicon wafer and the lower surface of the last ...

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Problems solved by technology

When the liquid is in a negative pressure environment, the current gas-liquid separation scheme cannot be realized

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