Airtight and two-level porous gas-liquid recycling device for immersion-type photoetching machine
A gas-liquid recovery and gas-sealing technology, which is used in photolithographic process exposure devices, microlithography exposure equipment, etc., can solve problems such as liquid leakage, sealing gas entrainment, vibration, etc., to slow down flow rate, reduce vibration, and reduce The effect of small shocks
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[0036] The specific implementation process of the present invention will be described in detail below with reference to the drawings and embodiments.
[0037] Such as figure 1 As shown, the present invention includes an air-tight and gas-liquid isolation device 2 installed between the projection objective lens group 1 and the silicon wafer 3 in the immersion lithography machine. The air-tight and gas-liquid isolation device 2 is installed in the projection objective lens group 1 and Between the silicon wafers 3, the gas-sealing and gas-liquid isolation device 2 is provided with a central through hole. The main function of the gas-sealing and gas-liquid isolation device 2 is to confine the immersion liquid 11 directly below the projection objective lens group 1. 1 The emitted light passes through the central through hole of the air-sealed and gas-liquid isolation device 2 and then enters the gap flow field, that is, passes through the immersion liquid 11 and irradiates the silicon ...
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