Air intake device and plasma processing equipment

Abstract

The invention provides an air intake device and plasma processing equipment, including a device body, in which a first channel, a second channel and a one-way channel are formed, wherein the first channel is connected to the cleaning gas source and the reaction chamber respectively. The internal communication is used to transport the cleaning gas into the reaction chamber; the inlet end of the second channel is communicated with the process gas source, and the gas outlet end of the second channel is communicated with the first channel through a one-way channel, and the second channel is used to transfer the process gas The gas is transported into the first channel and flows into the reaction chamber through the first channel; and the one-way channel is configured to only be able to transport the process gas in a single direction from the second channel to the first channel. The air intake device provided by the present invention can prevent the cleaning gas from flowing into the channel used to transmit the process gas, thereby reducing or even avoiding the problem of contamination of the process gas due to mixing with the cleaning gas, thereby improving the process quality of the plasma processing equipment .

Description

technical field [0001] The invention belongs to the field of semiconductor equipment manufacturing, and in particular relates to an air intake device and plasma processing equipment. Background technique [0002] During the process of etching, sputtering and deposition using plasma processing equipment, pollution particles such as etching by-products are often generated in the reaction chamber and deposited on the inner wall of the chamber and the surface of parts , these pollution particles accumulate to a certain thickness with the increase of process time, not only will pollute the processed workpiece, but also change the process environment, resulting in adverse effects on the process results, for this reason, it is necessary to A cleaning process is performed on the reaction chamber to remove contamination particles deposited on the inner walls of the chamber and on the surface of the components. [0003] Moreover, since the cleaning process is often carried out altern...

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Problems solved by technology

[0006] The present invention aims to solve the technical problems existing in the prior art, and provides an air intake device and plasma processing equipment, which can prevent the cleaning gas from flowing into the channel used to transport the process gas, thereby reducing or even avoiding the occurrence of process gas The problem of contamination caused by mixing with cleaning gas can improve the process quality of plasma processing equipment

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