Formula of high-dispersion slurry for slurry shield

A mud-water shield, high dispersion technology, applied in the field of shield construction application materials, can solve the problems of simple composition, difficult to meet the construction requirements of different strata, poor dispersion, etc., to achieve good dispersion performance, excellent sand-carrying ability, and excellent stability Effect

Inactive Publication Date: 2014-12-03
SHANGHAI SUNRISE POLYMER MATERIAL CO LTD
View PDF5 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, ordinary bentonite-based mud has simple components, single function, and poor dispersion, and it is difficult to meet the construction requirements of different strata, especially in gravel strata, which cannot form a mud film well.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Formula of high-dispersion slurry for slurry shield

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment 1

[0013] The high-dispersion cement slurry formula for mud-water shield includes sodium bentonite, water, soda ash, CMC-HV, polycarboxylate hyperdispersant, wherein the mass percentage of soda ash to bentonite is 0.1%, and the mass percentage of CMC to bentonite is 20% %, the polycarboxylate hyperdispersant accounted for 2.0% by mass of bentonite, and the total solid accounted for 1% by mass of water. In this example, polycarboxylate hyperdispersant sd-a was used by Sanrui Polymer Materials Co., Ltd. Provided by the company, it is a polyether polycarboxylic acid with a weight average molecular weight of 50,000.

specific Embodiment 2

[0014] The high-dispersion cement slurry formula for mud-water shield includes sodium bentonite, water, soda ash, CMC-HV, polycarboxylate hyperdispersant, wherein the mass percentage of soda ash to bentonite is 0.05%, and the mass percentage of CMC to bentonite is 3 %, the polycarboxylate hyperdispersant accounted for 0.5% by mass of bentonite, and the total solids accounted for 2% by mass of water. In this example, polycarboxylate hyperdispersant sd-f was used, produced by Sanrui Polymer Materials Co., Ltd. Provided by the company, it is a polyether polycarboxylic acid with a weight average molecular weight of 70,000.

specific Embodiment 3

[0015] The high-dispersion cement slurry formula for mud-water shield includes sodium bentonite, water, soda ash, CMC-HV, polycarboxylate hyperdispersant, wherein the mass percentage of soda ash to bentonite is 0.06%, and the mass percentage of CMC to bentonite is 5% %, the polycarboxylate hyperdispersant accounted for 1.0% by mass of bentonite, and the total solids accounted for 2% by mass of water. In this example, polycarboxylate hyperdispersant sd-a was used by Sanrui Polymer Materials Co., Ltd. Provided by the company, it is a polyether polycarboxylic acid with a weight average molecular weight of 50,000.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
colloid rateaaaaaaaaaa
Login to view more

Abstract

The invention relates to a formula of high-dispersion slurry for a slurry shield. The high-dispersion slurry is composed of bentonite, water, sodium carbonate, sodium carboxymethyl cellulose (CMC) and a polycarboxylic acid superdispersant, wherein sodium carbonate accounts for 0.01-0.1% of the mass percent of bentonite, CMC accounts for 0.1-20% of the mass percent of bentonite, the polycarboxylic acid superdispersant accounts for 0.1-7% of the mass percent of bentonite, and total solids account for 1-5% of the mass percent of the water. The formula is characterized in that the polycarboxylic acid superdispersant is used. The slurry disclosed by the invention can be used for slurry balance shield construction, has a favorable stabilizing effect for excavation faces with different geologic structures and has better dispersibility, lower water loss as well as more excellent sand carrying capacity and stability as comparison with other kinds of common slurry.

Description

technical field [0001] The invention relates to an application material for shield tunneling, in particular to a formula of highly dispersed mud for mudwater shield tunneling. Background technique [0002] In the mud-water balance shield construction process, the supporting mud plays a vital role: the shield needs to use mud pressure and frontal earth pressure to produce a mud-water balance effect in order to effectively support the frontal soil. A mud film is formed on the surface, and the thickness of the mud film increases with the increase of the penetration time, thereby effectively improving the penetration resistance; the mud has a certain sand-carrying ability and can be brought to the ground. Therefore, mud with good performance is one of the necessary conditions for smooth mud-water shield construction. [0003] Bentonite has strong hygroscopicity and expansibility. It can absorb 8 to 15 times its own volume of water, and its volume expansion can be as high as 30 ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C04B28/00
Inventor 杨娟王伟山傅乐峰
Owner SHANGHAI SUNRISE POLYMER MATERIAL CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap