Cerium terbium double-doped nitrogen silicon lanthanum luminescent material and preparation method and application thereof
A luminescent material and double-doping technology, applied in luminescent materials, electroluminescent light sources, chemical instruments and methods, etc.
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[0032] The preparation method of the above-mentioned cerium-terbium double-doped silicon-lanthanum nitride luminescent material comprises the following steps:
[0033] Step S11, according to La 2 Si 6 N 10 :xCe 3+ , yTb 3+ The stoichiometric ratio of each element weighs LaN, Si 3 N 4 , CeN and TbN powder, wherein, x is 0.01-0.05, and y is 0.01-0.06.
[0034] In this step, preferably, x is 0.02 and y is 0.03.
[0035]In this step, preferably, LaN, Si 3 N 4 , the molar ratio of CeN and TbN powder is 2:2:(0.01~0.05):(0.01~0.06);
[0036] Step S12, sintering the mixed powder at 900°C-1300°C for 0.5-5 hours to obtain the cerium-terbium double-doped lanthanum-silicon-nitride luminescent material, whose chemical formula is La 2 Si 6 N 10 :xCe 3+ , yTb 3+ , wherein, x is 0.01-0.05, and y is 0.01-0.06.
[0037] In this step, it is preferable to sinter at 1250° C. for 3 hours.
[0038] A cerium-terbium double-doped lanthanum-silicon-nitride luminescent film according to ...
Embodiment 1
[0065] The powder with a purity of 99.99% is selected, and LaN, Si 3 N 4 , CeN and TbN powders are uniformly mixed according to the molar ratio of 2:2:0.02:0.03, and then sintered at 1250°C to form a ceramic target with a diameter of 50mm and a thickness of 2mm, and the target is loaded into a vacuum chamber. Then, the glass substrate with ITO was ultrasonically cleaned with acetone, absolute ethanol and deionized water successively, treated with oxygen plasma, and placed in a vacuum chamber. The distance between the target and the substrate was set to 60mm. Use a mechanical pump and a molecular pump to pump the vacuum of the cavity to 5.0×10 -4 Pa, the working gas flow rate of oxygen is 20sccm, the pressure is adjusted to 3.0Pa, the substrate temperature is 500°C, and the laser energy is 150W. The chemical formula of the obtained sample is La 2 Si 6 N 10 : 0.02Ce 3+ , 0.03Tb 3+ luminescent thin film, and then vapor-deposit a layer of Ag on the luminescent thin film as...
Embodiment 2
[0071] The powder with a purity of 99.99% is selected, and LaN, Si 3 N 4, CeN and TbN powders are uniformly mixed according to the molar ratio of 2:2:0.01:0.01, and then sintered at 900°C to form a ceramic target with a diameter of 50mm and a thickness of 2mm, and the target is loaded into a vacuum chamber. Then, the glass substrate with ITO was ultrasonically cleaned with acetone, absolute ethanol and deionized water successively, treated with oxygen plasma, and placed in a vacuum chamber. The distance between the target and the substrate was set to 45mm. Use a mechanical pump and a molecular pump to evacuate the vacuum of the chamber to 1.0×10 -3 Pa, the working gas flow rate of oxygen is 10sccm, the pressure is adjusted to 0.5Pa, the substrate temperature is 250°C, and the laser energy is 80W. The chemical formula of the obtained sample is La 2 Si 6 N 10 : 0.01Ce 3+ , 0.01Tb 3+ luminescent thin film, and then vapor-deposit a layer of Ag on the luminescent thin film ...
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