A safety protection device for a workpiece table

A technology of safety protection device and workpiece table, which is applied in the direction of exposure device of photoplate making process, exposure equipment of microlithography, etc., can solve the problems of uneven distribution, damaged parts, large turning angle of the plate platform, etc., and achieves good anti-collision buffer effect, Large buffer stroke to overcome the effect of difficult to support effectively
CN104238273BActive Publication Date: 2016-09-28SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Patents(China)
Current Assignee / Owner
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Publication Date
2016-09-28

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Abstract

The invention relates to a safety protection device for a workpiece table, which includes a silicon wafer table and a coarse motion table arranged above the working plane, and also includes a movement limiting mechanism arranged around the working plane and an anti-collision buffer mechanism fixed on the coarse motion table , wherein the motion limit mechanism includes an X-direction limit mechanism and a Y-direction limit mechanism, and the X-direction limit mechanism and the Y-direction limit mechanism respectively include a limit edge, a support guide mechanism and a buffer, and the limit edge is fixed On the support and guide mechanism, and move along the X or Y direction, the buffer is fixed on the limit side bar; the anti-collision buffer mechanism includes a collision frame and an elastic member, and the two ends of the elastic member are respectively connected to the collision frame and the coarse motion table . The invention utilizes a motion limiting mechanism to limit the range of motion of the workpiece table to prevent the workpiece table from moving out of the working plane when the control fails, and at the same time uses an anti-collision buffer mechanism to reduce the impact on the workpiece when collisions occur between the workpiece tables and between the workpiece table and the collision frame. The impact of the internal devices and components of the platform.
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Description

technical field

[0001] The invention relates to the field of semiconductor photolithography equipment, in particular to a safety protection device for a workpiece table. Background technique

[0002] In semiconductor lithography equipment, precision workpiece stage motion systems such as silicon wafer stages and mask stages are extremely important key components, and their typical structural forms are as follows: the workpiece stage is usually composed of coarse and fine motion stages, and the two together realize the workpiece The precise motion positioning of the table in the direction of six degrees of freedom in space. With the continuous improvement of the integration of VLSI devices, the requirements for the productivity index of the lithography machine are also continuously improved, which puts forward higher requirements for the movement speed, acceleration and precision of the workpiece table.

[0003] Due to the characteristics of high output density, high speed, ...

Claims

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