Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

High-flux plane light source device

A planar light source and high-flux technology, applied to gas discharge lamp parts, lamp parts, gas plasma lamps, etc., can solve problems such as multi-electrode arc discharge instability, arc chamber wall and transmission window pollution, damage, etc. , to achieve the effect of increasing window life, increasing arc power, and improving uniformity

Active Publication Date: 2014-12-31
合肥碳艺科技有限公司
View PDF6 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The purpose of the present invention is also to solve the problem of instability of multi-electrode arc discharge and the pollution and damage of the arc chamber wall and transmission window caused by the flow of high-temperature gas generated by the discharge.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-flux plane light source device
  • High-flux plane light source device
  • High-flux plane light source device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0056] The main structural dimensions of the device: the diameter of the anode arc chamber is 100mm, the length of the arc chamber is 300mm; the number of rod-shaped cathodes is 8, and the diameter of the cathode is 6mm; the plate-shaped anode is composed of two parts, the center is a ring of pure tungsten metal, and the inner hole of the tungsten ring is the anode The circular hole has a diameter of 20mm, and the outer diameter of the tungsten ring is 30mm. The cathodes are arranged in the same plane, and the distance between the diagonal cathode tips is 80mm.

[0057] Electrode material: the rod-shaped cathode is lanthanum tungsten (containing 3% lanthanum oxide); the anode and arc chamber wall are T2 copper, and the surface is coated with aluminum film.

[0058] Inflatable pressure: 1MPa argon.

[0059] Arc current: each cathode current 200A, total current 1600A;

[0060] Arc voltage: 40V, arc power 64kW, arc radiation power over 10kW.

[0061] Compared with the "point" ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Angleaaaaaaaaaa
Login to View More

Abstract

The invention provides a device for generating a high-flux plane light source. The device mainly comprises a tubular arc chamber, n rod-like cathodes, a tabular anode in the middle of which a round hole is formed and a quartz transmitting window, wherein one end of the arc chamber is provided with the tabular anode, and the other end of the arc chamber is provided with the quartz transmitting window; emission ends of the n cathodes are respectively located at all vertexes of an N-polygon in the arc chamber; the N-polygon, the arc chamber and the round hole of the anode are coaxial; gas injection apertures are distributed around each cathode on the wall of the arc chamber; electric arcs starting from the emission ends of the n cathodes are gathered to the round hole of the anode, and therefore roughly uniform disk-shaped plasmas are formed; generated high-strength emitted light is directly reflected by the wall of the arc chamber, and thus, the high-flux plane light source which is comparatively uniform is formed on the outer part of the transmitting window; the flow of gas is forced to stabilize the electric arcs so as to protect the transmitting window and the wall of the arc chamber from electrode ablated vapor pollution. The device provided by the invention has the advantages that the power of the electric arcs is improved, the luminous efficacy is enhanced, and by a gas flow design, the transmitting window and the wall of the arc chamber are protected from the metallic vapor pollution.

Description

technical field [0001] The invention belongs to the technical field of gas discharge light sources, and specifically relates to a device for generating high-flux planar light sources, which is used to generate high-flux continuous irradiated light, and is used as a device for high-flux planar light irradiation and high-flux solar simulators light source. Background technique [0002] High-flux light sources generate high temperatures by directly irradiating the surface of devices, creating extreme high-temperature conditions in various environments and atmospheres. Scientific instruments, and have a special role in the production of many special materials (such as nano-materials, high-temperature-resistant materials, etc.). [0003] Most of the existing high-flux light sources are combined and focused by multiple high-voltage short-arc xenon lamps, which have problems such as complex structure, large size, uneven irradiation surface, and short life of the light source. Bec...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01J63/08H01J61/52H01J63/02
Inventor 夏维东王城夏凡
Owner 合肥碳艺科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products