49results about "Gas plasma lamps" patented technology

A pulsed electron ablation (PEA) utilizes a source of a high power density electron beam which includes a cathode plasma supplying electrons for generation of the electron beam and an anode plasma having a front layer extending in the processing chamber in a counter relationship with the front layer of the cathode plasma. A gas supply line is coupled to the processing chamber to supply a process gas in a controlled fashion to the anode to create a pressure gradient between the anode and the cathode plasma, and to stimulate an intense ionization of the process gas in the vicinity to the anode to form the anode plasma. The power density of the electron beam sharply increases as the result of an interaction of said cathode and anode plasmas at the double space charge contact layer formed between their fronts. A target is positioned in the processing chamber a predetermined distance from the front layer of the cathode plasma and is exposed to the electron beam to produce stream of the ablation plasma.

An image forming apparatus in which a first substrate provided with an electron-emitting device and an image displaying member which electrons emitted from the electron-emitting device irradiate are arranged to be opposed is provided with a deflecting means deflecting the electrons emitted from the electron-emitting device and a trapping unit trapping an inert gas ionized by the electrons. Thereby, the damages of the electron-emitting device by the inert gas are prevented, and the life of an image display apparatus is aimed to be elongated.

A light source has a rear glass substrate and a front glass substrate having a plate surface disposed in facing relation to a principal surface of the rear glass substrate. The plate surface of the front glass substrate is coated with a phosphor. A two-dimensional array of electron emitters is disposed on the principal surface of the rear glass substrate. A space defined between the rear glass substrate and the front glass substrate is filled with a gas. The gas may be an Hg (mercury) gas or an Xe (xenon) gas.

An arrangement for emitting light includes a hermetically sealed casing with a window, a layer of a fluorescent substance arranged within the casing covering at least a major part of the window, an electron emitting cathode arranged within the casing, and an anode. The casing is filled with a gas suitable for electron avalanche amplification. In operation, the cathode and anode are held at an electric potential such that said emitted electrons are accelerated and avalanche amplified in the gas. The layer of the fluorescent substance is arranged to emit light through the window in response to avalanche amplified electron bombardment and / or ultraviolet light emitted from the gas.

The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber, and an optical system for collecting plasma radiation.

Excimers are formed in a high pressure gas by applying a potential between a first electrode (14, 214) and a counter electrode (25, 226) so as to impose an electric field within the gas, or by introducing high energy electrons into the gas using an electron beam. A phosphor for converting the wavelength of radiation emitted from the formed excimers is disposed within the gas and outside a region (62, 162) where the excimers are expected to be formed, so as to avoid degradation of the phosphor.

Provided are a light emitting device using electron emission with a low driving voltage and high luminous efficiency, and a flat display apparatus using the light emitting device. In addition, a light emitting device using electron emission in which with a nano-sized gap can be formed with repeatability and have reliability is provided. The light emitting device includes: a plurality of PN junctions (34), each including a depletion layer having a predetermined thickness; an anode electrode (12) facing the depletion layer and separated from the depletion layer by a predetermined distance; and a phosphor layer (13) formed on a surface of the anode electrode. The flat display apparatus includes the light emitting device.

The invention adopts a radio frequency gas discharge manner to excite the inert gas plasmas and provides a device for generating a vacuum ultraviolet light source. The device comprises four parts: a central cylindrical shaped interaction cavity, a coaxial circular power charge light source cavity, a radio frequency spiral resonance excitation cavity and an ultrahigh vacuum flange connection component. The device uses a circular tube made of magnesium fluoride crystal materials as its optical window; the vacuum ultraviolet light is generated in the coaxial circular power charge light source cavity on the outer wall of magnesium fluoride circular tube, then penetrates and is radiated into the central cylindrical shaped interaction cavity so that the light could act on a target material directly. In this manner, the travel distance of the light rays is shortened; the effective size of the light source is increased; the beam-divergence angle is reduced; and the utilization efficiency of the light source is increased. According to the invention, the device adopts an electrodeless radio frequency charge manner to excite the gas plasmas, and produces vacuum ultraviolent photons with specific wavelengths by filling different inert gases. Through the adjustment of the parameters of the gases like gas pressure, radio frequency and power, it is possible to adjust the output power of the vacuum ultraviolet light so as to meet the requirements of various applications on the light source.

A planar electron emitter, based on the existence of quasi-ballistic transport of electrons is disclosed. In its preferred embodiment the planar electron emitter structure consists of a body of finite gap pure semiconductor or insulator, the said body of macroscopic thickness (~1 mm) being terminated by two parallel surfaces and of a set of two electrodes deposited / grown on the said two free surfaces such that when a low external electrical field (~100 V / cm) is applied to this structure, consisting of two electrodes and the said semiconductor or insulating body sandwiched between them, a large fraction of electrons injected into the said semiconductor or insulator body from the negatively charged electrode (cathode) is quasi-ballistic in nature, that is this fraction of injected electrons is accelerated within the said semiconductor or insulator body without suffering any appreciable inelastic energy losses, thereby achieving sufficient energy and appropriate momentum at the positively charged electrode (anode) to be able to traverse through the said anode and to escape from the said structure into empty space (vacuum), said semiconductor or insulator body comprises a material or material system having a predetermined crystal orientation.

The invention provides a high-efficiency and high-brightness vacuum ultraviolet light source apparatus. The apparatus comprises a plasma retainer, a radio frequency electric field focuser, and a sealing fixing device. According to the apparatus, a high-density radio frequency electric field (the intensity of the electric field can reach 107 V / m) is formed in a local space by employing a plasma local field principle, ionization excitation of plasma can be directly performed without a conventional ignition device, the system is simplified, and the practicality and the stability are improved; the ultraviolet light light-emitting intensity above the grade of 10<18> photons / (Sr*S) can be realized through reasonable configuration of dimension parameters and air-inlet parameters of the radio frequency electric field focuser and the plasma retainer; the apparatus is free of the conventional working gas, various different working gases can be used, and the energy of the emitted ultraviolet light can cover 6-50 eV; and the ultra-long service lifetime of more than 10,000 hours can be provided.