Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A coaxial gas discharge vacuum ultraviolet light source device

A vacuum ultraviolet light source and gas discharge technology, applied in the direction of gas plasma lamps, lamp parts, etc., can solve the problems of low output light power and low photon utilization rate, achieve high effective vacuum ultraviolet light power, increase effective area, The effect of improving the purity

Active Publication Date: 2018-11-13
PLA PEOPLES LIBERATION ARMY OF CHINA STRATEGIC SUPPORT FORCE AEROSPACE ENG UNIV
View PDF8 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The invention overcomes the disadvantages of low photon utilization rate and low output light power of the traditional vacuum ultraviolet light source, adopts the method of exciting gas plasma in a spiral resonant cavity, and provides a radio frequency discharge lamp structure for generating vacuum ultraviolet light. The heart-shaped discharge structure design makes full use of the high transmittance of magnesium fluoride crystals to vacuum ultraviolet light, and improves the utilization rate of vacuum ultraviolet light sources by optimizing the structure

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A coaxial gas discharge vacuum ultraviolet light source device
  • A coaxial gas discharge vacuum ultraviolet light source device

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0017] Specific implementation mode one: combine figure 1 To illustrate this embodiment, the overall structure of the coaxial gas discharge vacuum ultraviolet light source device described in this embodiment includes a central cylindrical interaction cavity, a coaxial annular discharge light source cavity, a radio frequency spiral resonance excitation cavity and an ultra-high vacuum flange connector. part. The specific implementation steps are as follows: firstly, the solenoid coil is sleeved on the outside of the quartz glass tube 2, and bonded in the installation groove of the flange connector 5 with an adhesive that can be used in an ultra-high vacuum environment, so as to realize the connection between the outer wall of the discharge light source cavity and the atmosphere. The length of the quartz glass tube determines the overall length reference of the entire device; secondly, the copper shielding layer 4 is installed on the outside of the coil in a coaxial manner, and t...

specific Embodiment approach 2

[0018] Specific embodiment two: this embodiment is a further limitation of the coaxial gas discharge vacuum ultraviolet light source device described in embodiment one, combined with figure 1 This embodiment will be described. In this embodiment, the gas conduits on the flange connector 5 can be increased or decreased as required. By adjusting the switch mode of the gas conduits, switching between different working states of flowing gas and non-flowing gas can be realized: the working gas in the flowing state has an inlet, There is also an outlet. When the vacuum ultraviolet lamp is working, the gas is in a dynamic balance in the discharge light source cavity; according to the way of air intake and outlet, it can also be divided into forward flow (gas flows in from 6-1 and flows out from 6-3) and countercurrent (gas flows from 6-3) 1 inflow, flow out from 6-2) two states. When working in a non-flowing state, the gas is sealed inside the cavity of the discharge light source an...

specific Embodiment approach 3

[0019] Embodiment 3: This embodiment is a further limitation of the coaxial gas discharge vacuum ultraviolet light source device described in Embodiment 1. In this embodiment, helium can be filled into the cavity of the discharge light source through the gas conduit according to the needs of practical applications. , neon, argon, krypton, xenon and other different working gases or mixed gases to generate vacuum ultraviolet light with different wavelengths; by adjusting the gas pressure in the discharge light source cavity and the frequency and power of the RF signal in the spiral resonant cavity, etc., you can Adjust the output power of vacuum ultraviolet light to meet the needs of different applications for light sources.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention adopts a radio frequency gas discharge manner to excite the inert gas plasmas and provides a device for generating a vacuum ultraviolet light source. The device comprises four parts: a central cylindrical shaped interaction cavity, a coaxial circular power charge light source cavity, a radio frequency spiral resonance excitation cavity and an ultrahigh vacuum flange connection component. The device uses a circular tube made of magnesium fluoride crystal materials as its optical window; the vacuum ultraviolet light is generated in the coaxial circular power charge light source cavity on the outer wall of magnesium fluoride circular tube, then penetrates and is radiated into the central cylindrical shaped interaction cavity so that the light could act on a target material directly. In this manner, the travel distance of the light rays is shortened; the effective size of the light source is increased; the beam-divergence angle is reduced; and the utilization efficiency of the light source is increased. According to the invention, the device adopts an electrodeless radio frequency charge manner to excite the gas plasmas, and produces vacuum ultraviolent photons with specific wavelengths by filling different inert gases. Through the adjustment of the parameters of the gases like gas pressure, radio frequency and power, it is possible to adjust the output power of the vacuum ultraviolet light so as to meet the requirements of various applications on the light source.

Description

technical field [0001] The invention relates to a coaxial gas discharge vacuum ultraviolet light source device, which is used in the fields of vacuum ultraviolet spectroscopy measurement, vacuum ultraviolet photochemical analysis, vacuum ultraviolet spectroscopy and the like. Background technique [0002] Vacuum ultraviolet light is a kind of high-energy photon, which can cause the energy level transition and chemical reaction of atoms and molecules in the material near the ionization energy. Research fields, such as vacuum ultraviolet spectroscopy, vacuum ultraviolet photochemistry, vacuum ultraviolet spectroscopic analysis, etc. How to design and develop a vacuum ultraviolet light source with long working life, high luminous efficiency and high stability is the primary problem to be solved in these studies. [0003] Vacuum ultraviolet light sources can be divided into three types: DC driven gas discharge vacuum ultraviolet lamps, radio frequency driven gas discharge vacuu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01J63/08H01J63/02
CPCH01J63/02H01J63/08
Inventor 洪延姬冯高平王明东王广宇宋俊玲
Owner PLA PEOPLES LIBERATION ARMY OF CHINA STRATEGIC SUPPORT FORCE AEROSPACE ENG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com